Dr. John L. Sturtevant
Director of Product Development
SPIE Involvement:
Author | Editor | Instructor
Publications (98)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume 12954, 1295415 (2024) https://doi.org/10.1117/12.3010925
KEYWORDS: Optical proximity correction, Lithography

Proceedings Article | 28 April 2023 Paper
Proceedings Volume 12495, 124950K (2023) https://doi.org/10.1117/12.2647882
KEYWORDS: SRAF, Optical proximity correction, Machine learning, Lithography, Simulations

Proceedings Article | 28 April 2023 Poster + Paper
Proceedings Volume 12494, 124941C (2023) https://doi.org/10.1117/12.2657767
KEYWORDS: SRAF, Printing, Extreme ultraviolet, Deep ultraviolet, Image quality, Lithography

Proceedings Article | 28 April 2023 Poster + Paper
Proceedings Volume 12494, 1249419 (2023) https://doi.org/10.1117/12.2658651
KEYWORDS: Failure analysis, Stochastic processes, Monte Carlo methods, Extreme ultraviolet lithography, Extreme ultraviolet, Statistical analysis, Optical proximity correction, Error analysis

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940J (2023) https://doi.org/10.1117/12.2658260
KEYWORDS: Optical proximity correction, Stochastic processes, Semiconducting wafers, Modeling, Simulations, Design and modelling, Extreme ultraviolet lithography, Calibration, Logic, Lithography

Showing 5 of 98 publications
Proceedings Volume Editor (7)

Showing 5 of 7 publications
Conference Committee Involvement (18)
Design-Process-Technology Co-optimization for Manufacturability XII
28 February 2018 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XI
1 March 2017 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability X
24 February 2016 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability IX
25 February 2015 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability VIII
26 February 2014 | San Jose, California, United States
Showing 5 of 18 Conference Committees
Course Instructor
SC121: Practical Process Design for Microlithography
The microlithography process is critical to the successful manufacture of integrated circuits. Control of the critical dimension (CD) of the device is paramount to producing devices that meet design specification. Eight critical process categories that control feature size are considered. This course looks at each category and discusses the impact that parameter variation has on the lithography process, on device yield and on final device performance. Emphasis is placed on the chemical and physical relationships within the lithography process.This course will consider lithography methods and process tuning appropriate for production lithography now that production is moving below historical limits.This is an excellent opportunity to get advice and specific direction on resist processing.
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