Mr. Jason Mayer Profile

Jason Mayer

at GLOBALFOUNDRIES Inc

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 24 May 2004 Paper

Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis

Matthew Sendelbach, Charles Archie, Bill Banke, Jason Mayer, Hideaki Nii, Pedro Herrera, Matt Hankinson

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.538009

KEYWORDS: Scatterometry, Semiconducting wafers, Scatter measurement, Scanning electron microscopy, Critical dimension metrology, Metrology, Manufacturing, Electrodes, Data modeling, Capacitance

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Proceedings Article | 2 June 2003 Paper

Characterizing and understanding stray tilt: the next major contributor to CD-SEM tool matching

Eric Solecky, Charles Archie, Jason Mayer, Roger Cornell, Ofer Adan

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485033

KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Metrology, Optical testing, Electron beams, Manufacturing, Tolerancing, Calibration, Process control

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Proceedings Article | 2 June 2003 Paper

New apparent beam width artifact and measurement methodology for CD-SEM resolution monitoring

Jason Mayer, Kylee Huizenga, Eric Solecky, Charles Archie, G. Banke, Robert Cogley, Claudine Nathan, James Robert

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485035

KEYWORDS: Semiconducting wafers, Line edge roughness, Atomic force microscopy, Scanning electron microscopy, Voltage controlled current source, Optical resolution, Manufacturing, Reticles, Edge roughness, Microelectronics

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Proceedings Article | 16 July 2002 Paper

Improving sub-150-nm lithography and etch CD-SEM correlations to AFM and electrical test

Eric Solecky, Jason Mayer, Charles Archie

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473486

KEYWORDS: Critical dimension metrology, Smoothing, Scanning electron microscopy, Etching, Signal to noise ratio, Semiconducting wafers, Standards development, Transistors, Finite element methods, Process control

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