Mr. James C. Foster Profile

James C. Foster

Sr. Applications Engineer at ASML US Inc

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Author

Publications (6)

Proceedings Article | 26 June 2003 Paper

Tool ranking using aberration measurements in a high-volume manufacturing facilility

Cesar Garza, Scott Warrick, Gary Seligman, Lena Zavyalova, Adrian van Zwol, James Foster

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485428

KEYWORDS: Scanning electron microscopy, Scanners, Image processing, Transistors, Manufacturing, Monochromatic aberrations, High volume manufacturing, Optical lithography, Spherical lenses, Semiconductors

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Proceedings Article | 30 July 2002 Paper

Aberration determination in early 157-nm exposure system

Bruce Smith, Will Conley, Cesar Garza, Jeff Meute, Daniel Miller, Georgia Rich, Victoria Graffenberg, Kim Dean, Shashikant Patel, Arnie Ford, James Foster, Marco Moers, Kevin Cummings, James Webb, Paul Dewa, Azeddine Zerrade, Susan MacDonald, Greg Hughes, Peter Dirksen

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474551

KEYWORDS: Photomasks, Monochromatic aberrations, Scanning electron microscopy, Image processing, Lithography, Manufacturing, Imaging systems, Wavefronts, Zernike polynomials, Edge detection

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Proceedings Article | 14 September 2001 Paper

Ring test aberration determination and device lithography correlation

Cesar Garza, Will Conley, Bernard Roman, Mike Schippers, James Foster, Jan Baselmans, Kevin Cummings, Donis Flagello

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435749

KEYWORDS: Monochromatic aberrations, Scanners, Scanning electron microscopy, Transistors, Lithography, Semiconducting wafers, Deep ultraviolet, Critical dimension metrology, Semiconductors, Phase measurement

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Proceedings Article | 5 July 2000 Paper

Advanced mix-and-match using a high-NA i-line scanner

Jan Kuijten, Thomas Harris, Ludo van der Heijden, David Witko, John Cossins, James Foster, Douglas Ritchie

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389079

KEYWORDS: Scanners, Deep ultraviolet, Semiconducting wafers, Distortion, Optical alignment, Overlay metrology, Lithography, Manufacturing, Photoresist materials, Reticles

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Proceedings Article | 17 May 1994 Paper

Lithographic performance at sub-300-nm design rules using a high-NA I-line stepper with optimized NA and (sigma) in conjunction with advanced PSM technology

Barton Katz, Richard Rogoff, James Foster, William Rericha, J. Brett Rolfson, Richard Holscher, Craig Sager, Patrick Reynolds

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175437

KEYWORDS: Lithography, Computer aided design, Manufacturing, Photomasks, Reticles, Phase shifts, Lithium, Design for manufacturability, Binary data, Photoresist materials

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Proceedings Article | 8 August 1993 Paper

I-line lithography for subhalf-micron design rules

Barton Katz, Leif Sloan, James Foster, Richard Rogoff, Ronfu Chu, Daniel Lee

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150434

KEYWORDS: Photoresist materials, Photoresist processing, Optical lithography, Oxides, Metals, Lithography, Lens design, Photomicroscopy, Product engineering, Semiconducting wafers

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Showing 5 of 6 publications

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