Dr. Hongbo Zhang Profile

Dr. Hongbo Zhang

at Synopsys Inc

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 26 March 2015 Paper

A pattern- and optics-independent compact model of Mask3D under off-axis illumination with significant efficiency and accuracy improvements

Hongbo Zhang, Qiliang Yan, David Wei, Ebo Croffie

Proceedings Volume 9426, 94260Q (2015) https://doi.org/10.1117/12.2086046

KEYWORDS: Photomasks, Calibration, Optical proximity correction, 3D modeling, Process modeling, Lithography, Performance modeling, Lithographic illumination, Optical testing, Source mask optimization

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Proceedings Article | 31 March 2014 Paper

Hybrid lithography for triple patterning decomposition and E-beam lithography

Haitong Tian, Hongbo Zhang, Zigang Xiao, Martin D. Wong

Proceedings Volume 9052, 90520P (2014) https://doi.org/10.1117/12.2046499

KEYWORDS: Electron beam lithography, Lithography, Vestigial sideband modulation, Photomasks, Semiconductors, Optical power tracking algorithms, Double patterning technology, Manufacturing, Optical lithography, Immersion lithography

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Proceedings Article | 10 September 2013 Paper

Color balancing for triple patterning lithography with complex designs

Haitong Tian, Hongbo Zhang, Martin Wong

Proceedings Volume 8880, 88800I (2013) https://doi.org/10.1117/12.2026285

KEYWORDS: Photomasks, Lithography, Legal, Optical lithography, Printing, Evolutionary algorithms, Electron beam lithography, Manufacturing, Standards development, Immersion lithography

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Proceedings Article | 9 September 2013 Paper

Efficient full-chip mask 3D model for off-axis illumination

Hongbo Zhang, Qiliang Yan, Lin Zhang, Ebo Croffie, Peter Brooker, Qian Ren, Yongfa Fan

Proceedings Volume 8880, 888023 (2013) https://doi.org/10.1117/12.2026650

KEYWORDS: Calibration, Photomasks, 3D modeling, Lithography, Cadmium, Semiconducting wafers, Lithographic illumination, Process modeling, Error analysis, Light

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Proceedings Article | 9 September 2013 Paper

DSA template mask determination and cut redistribution for advanced 1D gridded design

Zigang Xiao, Yuelin Du, Martin D.F. Wong, Hongbo Zhang

Proceedings Volume 8880, 888017 (2013) https://doi.org/10.1117/12.2025688

KEYWORDS: Optical lithography, Photomasks, Printing, Scanning electron microscopy, Baryon acoustic oscillations, Manufacturing, Electron beam lithography, Lithography, Mask making, Directed self assembly

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Proceedings Article | 9 September 2013 Paper

An accurate ILT-enabling full-chip mask 3D model for all-angle patterns

Hongbo Zhang, Qiliang Yan, Ebo Croffie, Lin Zhang, Yongfa Fan

Proceedings Volume 8880, 88800G (2013) https://doi.org/10.1117/12.2026468

KEYWORDS: Photomasks, 3D modeling, Data modeling, Optical proximity correction, Calibration, Polarization, Lithography, Performance modeling, Statistical modeling, 3D image processing

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Proceedings Article | 29 March 2013 Paper

Evaluation of cost-driven triple patterning lithography decomposition

Haitong Tian, Hongbo Zhang, Qiang Ma, Martin D. Wong

Proceedings Volume 8684, 868407 (2013) https://doi.org/10.1117/12.2011670

KEYWORDS: Optical lithography, Lithography, Optical power tracking algorithms, Photomasks, Printing, 193nm lithography, Detection and tracking algorithms, Immersion lithography, Process control, Computer programming

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Proceedings Article | 8 November 2012 Paper

Linear Time EUV Blank Defect Mitigation Algorithm Considering Tolerance to Inspection Inaccuracy

Yuelin Du, Hongbo Zhang, Martin D. Wong

Proceedings Volume 8522, 85221R (2012) https://doi.org/10.1117/12.964103

KEYWORDS: Tolerancing, Inspection, Extreme ultraviolet lithography, Algorithm development, Extreme ultraviolet, Photomasks, Mask making, Lithography, Defect inspection, Printing

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Proceedings Article | 23 March 2012 Paper

Efficient multi-die placement for blank defect mitigation in EUV lithography

Yuelin Du, Hongbo Zhang, Martin D. F. Wong, Yunfei Deng, Rasit Topaloglu

Proceedings Volume 8322, 832231 (2012) https://doi.org/10.1117/12.918075

KEYWORDS: Algorithm development, Dysprosium, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Tolerancing, Lithography, Computer simulations, Reticles, Optical alignment

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Proceedings Article | 13 March 2012 Paper

Characterization and decomposition of self-aligned quadruple patterning friendly layout

Hongbo Zhang, Yuelin Du, Martin D. Wong, Rasit Topaloglu

Proceedings Volume 8326, 83260F (2012) https://doi.org/10.1117/12.918078

KEYWORDS: Optical lithography, Photomasks, 193nm lithography, Electron beam lithography, Algorithm development, Metals, Standards development, Lithography, Manufacturing, Feature extraction

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Proceedings Article | 14 October 2011 Paper

Hot spot detection for indecomposable self-aligned double patterning layout

Hongbo Zhang, Yuelin Du, Martin D. Wong, Rasit Topaloglu

Proceedings Volume 8166, 81663E (2011) https://doi.org/10.1117/12.896990

KEYWORDS: Photomasks, Silicon, Detection and tracking algorithms, Double patterning technology, Lithography, Manufacturing, Semiconducting wafers, Binary data, Overlay metrology, Standards development

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Proceedings Article | 14 October 2011 Paper

EUV mask preparation considering blank defects mitigation

Yuelin Du, Hongbo Zhang, Martin Wong, Rasit Topaloglu

Proceedings Volume 8166, 816611 (2011) https://doi.org/10.1117/12.896996

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Algorithm development, Bismuth, Lithography, Inspection, Mask making, Electrochemical etching, Very large scale integration

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Proceedings Article | 5 April 2011 Paper

Characterization of the performance variation for regular standard cell with process nonidealities

Hongbo Zhang, Yuelin Du, Martin D. Wong, Kai-Yuan Chao

Proceedings Volume 7974, 79740T (2011) https://doi.org/10.1117/12.879326

KEYWORDS: Lithography, Printing, Statistical analysis, Device simulation, Photomasks, Manufacturing, Standards development, Yield improvement, Design for manufacturability, Light sources

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Proceedings Article | 23 March 2011 Paper

Effective decomposition algorithm for self-aligned double patterning lithography

Hongbo Zhang, Yuelin Du, Martin D. Wong, Rasit Topaloglu, Will Conley

Proceedings Volume 7973, 79730J (2011) https://doi.org/10.1117/12.879324

KEYWORDS: Photomasks, Lithography, Double patterning technology, Silicon, Semiconducting wafers, Etching, Overlay metrology, Logic, Tolerancing, Manufacturing

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Proceedings Article | 13 March 2009 Paper

Uniformity-aware standard cell design with accurate shape control

Hongbo Zhang, Martin Wong, Kai-Yuan Chao, Liang Deng, Soo-Han Choi

Proceedings Volume 7275, 72751G (2009) https://doi.org/10.1117/12.814445

KEYWORDS: Printing, Light sources, Double patterning technology, Standards development, Lithography, Metals, Resolution enhancement technologies, Manufacturing, Very large scale integration, Photomasks

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Proceedings Article | 12 March 2008 Paper

A new OPC method for double patterning technology

Yijie Pan, Hongbo Zhang, Ye Chen

Proceedings Volume 6924, 692422 (2008) https://doi.org/10.1117/12.772345

KEYWORDS: Optical proximity correction, Double patterning technology, Model-based design, Photomasks, Logic, Critical dimension metrology, Optics manufacturing, Printing, Manufacturing, Very large scale integration

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Proceedings Article | 4 March 2008 Paper

Manufacturing for design: a novel interconnect optimization method

Hongbo Zhang, Liang Deng, Kai-Yuan Chao, Martin Wong

Proceedings Volume 6925, 69250G (2008) https://doi.org/10.1117/12.772341

KEYWORDS: Manufacturing, Design for manufacturability, Optical proximity correction, Design for manufacturing, Capacitance, Resolution enhancement technologies, Photomasks, Process modeling, Tolerancing, Lithography

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Proceedings Article | 21 March 2007 Paper

SOFT: smooth OPC fixing technique for ECO process

Hongbo Zhang, Zheng Shi

Proceedings Volume 6521, 65211H (2007) https://doi.org/10.1117/12.712878

KEYWORDS: Optical proximity correction, Image segmentation, Lithography, Manufacturing, Resolution enhancement technologies, Photomasks, Design for manufacturability, Process modeling, Model-based design, Design for manufacturing

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Showing 5 of 18 publications

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