Dr. Hong Zhuang Profile

Dr. Hong Zhuang

Senior Research Chemist at EMD Electronics

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Author

Publications (4)

Proceedings Article | 6 April 2007 Paper

Organic ArF bottom anti-reflective coatings for immersion lithography

Zhong Xiang, Hong Zhuang, Hengpeng Wu, Jianhui Shan, Dave Abdallah, Jian Yin, Salem Mullen, Huirong Yao, Eleazar Gonzalez, Mark Neisser

Proceedings Volume 6519, 651929 (2007) https://doi.org/10.1117/12.710669

KEYWORDS: Etching, Reflectivity, Immersion lithography, Photomasks, Chemical vapor deposition, Lithography, Bottom antireflective coatings, Semiconducting wafers, Control systems, Signal attenuation

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Proceedings Article | 23 March 2007 Paper

Development of nanocomposite resists with high plasma etch resistance

Chunwei Chen, Hong Zhuang, Ping-Hung Lu, Mark Neisser, Georg Pawlowski

Proceedings Volume 6519, 65192E (2007) https://doi.org/10.1117/12.711601

KEYWORDS: Silica, Etching, Nanocomposites, Photoresist materials, Plasma etching, Nanoparticles, Plasma, Resistance, Deep reactive ion etching, Particles

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Proceedings Article | 29 March 2006 Paper

The effects of etch chemistry on the etch rates of ArF BARC products

Hong Zhuang, Dave Abdallah, Zhong Xiang, Hengpeng Wu, Jianhui Shan, Ping-Hung Lu, Mark Neisser, Eugene Karwacki, Bing Ji, Peter Badowski

Proceedings Volume 6153, 61530N (2006) https://doi.org/10.1117/12.657128

KEYWORDS: Etching, Reactive ion etching, Chemistry, Polymers, Anisotropic etching, Ions, Semiconducting wafers, Photoresist materials, Oxygen, Gases

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Proceedings Article | 12 June 2003 Paper

Optimized thick film processing for bumping layers

Stanley Wanat, Robert Plass, Ernesto Sison, Hong Zhuang, Ping-Hung Lu, Clifford Hamel, Jeffrey Guevremont

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485181

KEYWORDS: Semiconducting wafers, Connectors, Thin film coatings, Metals, Photoresist processing, Plating, Solids, Photoresist developing, Copper, Photoresist materials

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