Henry Chen
at ChangXin Memory Technologies Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 May 2022 Poster + Paper
Proceedings Volume 12053, 120531M (2022) https://doi.org/10.1117/12.2612486
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, High volume manufacturing, Scanners, Data modeling, Stars, Lithography, Contamination, Optimization (mathematics)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Chia Hung Chen, Sheng-Tsung Tsao, Jie Du, Wenkang Song, Hongwei Zhu, Ji-Ling Hou, Longfei Shen, Sunny Xia, Simon Mathijssen, Marc Noot, Farzad Farhadzadeh, Kimi Yang, Xing Ma, Zhi-Qiang Tang, Jing Wang, Yu Liu, David Xu, Herman Heijmerikx, Eason Su, Elliott Mc Namara, Kaustuve Bhattacharyya
Proceedings Volume 11611, 116112Z (2021) https://doi.org/10.1117/12.2583818
KEYWORDS: Metrology, Overlay metrology, High volume manufacturing, Front end of line, Detection and tracking algorithms

Proceedings Article | 20 March 2020 Paper
Chia-Hung Chen, Sheng-Tsung Tsao, CongCong Fan, Jie Du, Richer Yang, Asei Chou
Proceedings Volume 11325, 113252V (2020) https://doi.org/10.1117/12.2552027
KEYWORDS: Optical alignment, Semiconducting wafers, Light sources, Scanners, Signal detection, Reliability

Proceedings Article | 20 March 2020 Paper
Chia-Hung Chen, Sheng-Tsung Tsao, CongCong Fan, Jie Du, Richer Yang, Asei Chou, Kunyuan Chen, Jimmy Chang, JunJun Zhang, Wallace He, Leslie Zhang, YunSheng Xia
Proceedings Volume 11325, 113252U (2020) https://doi.org/10.1117/12.2552025
KEYWORDS: Optical alignment, Photomasks, Semiconducting wafers, Metrology, Phase shifts, Overlay metrology, Optical proximity correction, Diffraction

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