Dr. Hans Koop Profile

Dr. Hans Koop

Application Engineer at Synopsys GmbH

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Publications (3)

Proceedings Article | 1 November 2007 Paper

OPC verification on cell level using fully rigorous mask topography simulation

Vitaly Domnenko, Thomas Klimpel, Georg Viehoever, Hans Koop, Lawrence Melvin, Thomas Schmoeller

Proceedings Volume 6730, 67304J (2007) https://doi.org/10.1117/12.746625

KEYWORDS: Photomasks, Optical proximity correction, Finite-difference time-domain method, Lithography, 3D modeling, Image processing, Polarization, Electromagnetism, 3D acquisition, 3D image processing

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Proceedings Article | 30 October 2007 Paper

Investigation of mask defectivity in full field EUV lithography

Rik Jonckheere, Fumio Iwamoto, G. Lorusso, A. Goethals, K. Ronse, H. Koop, T. Schmoeller

Proceedings Volume 6730, 673012 (2007) https://doi.org/10.1117/12.746566

KEYWORDS: Photomasks, Opacity, Carbon, Particles, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Reticles, Waveguides, Printing

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Proceedings Article | 12 May 2007 Paper

Impact of mask pellicle effects to OPC quality

Hans Koop, Thomas Schmoeller, Wen-Hao Cheng

Proceedings Volume 6607, 66070N (2007) https://doi.org/10.1117/12.728937

KEYWORDS: Pellicles, Photomasks, Optical proximity correction, Polarization, Apodization, Lithography, Cadmium, Critical dimension metrology, Projection systems, Image quality

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