Mr. Grigore A. Timco Profile

Grigore A. Timco

at Univ of Manchester

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 1 May 2023 Presentation + Paper

Enhancing the sensitivity of a high resolution negative-tone metal organic photoresist for extreme ultra violet lithography

Scott Lewis, Hayden Alty, Michaela Vockenhuber, Guy DeRose, Dimitrios Kazazis, Grigore Timco, James Mann, Paul Winpenny, Axel Scherer, Yasin Ekinci, Richard Winpenny

Proceedings Volume 12498, 124980X (2023) https://doi.org/10.1117/12.2658324

KEYWORDS: Extreme ultraviolet lithography, Etching, Electron beam lithography, Monte Carlo methods, Electron beams, Mercury, Silicon, Molecules, Dry etching

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SPIE Journal Paper | 19 September 2022

Dry heterometallic resist processing based on thermal sublimation deposition and development

Dario Goldfarb, Scott Lewis, Richard Grindell, Grigore Timco, Richard E. Winpenny

JM3, Vol. 21, Issue 04, 041406, (September 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041406

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Photoresist processing, Extreme ultraviolet lithography, Electron beams, Silicon, Electron beam lithography, Etching, Chromium, Nickel

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SPIE Journal Paper | 2 June 2022

Sensitivity enhancement of a high-resolution negative-tone nonchemically amplified metal organic photoresist for extreme ultraviolet lithography

Scott Lewis, Hayden Alty, Michaela Vockenhuber, Guy DeRose, Antonio Fernandez Mato, Dimitrios Kazazis, Paul Winpenny, Richard Grindell, Grigore Timco, Axel Scherer, Yasin Ekinci, Richard E. Winpenny

JM3, Vol. 21, Issue 04, 041404, (June 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041404

KEYWORDS: Extreme ultraviolet lithography, Selenium, Electron beam lithography, Monte Carlo methods, Metals, Mercury, Molecules, Chemical species, Photomicroscopy, Absorption

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Proceedings Article | 3 October 2018 Paper

Design and implementation of the next generation electron beam resists for the production of EUVL photomasks

Scott Lewis, Guy DeRose, Hayden Alty, Matthew Hunt, Jarvis Li, Alex Werthiem, Trevor Fowler, Sang Kook Lee, Christopher Muryn, Grigore Timco, Axel Scherer, Stephen Yeates, Richard Winpenny

Proceedings Volume 10810, 108100N (2018) https://doi.org/10.1117/12.2501808

KEYWORDS: Chromium, Silicon, Etching, Molecules, Scattering, Nanostructures, Monte Carlo methods, Photomasks, Extreme ultraviolet lithography, Electron beam lithography

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