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Gordon Abbott
Software Engineering Manager at KLA Corp
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Publications (1)
Proceedings Article | 27 March 2006 Paper
Advanced DFM applications using design-based metrology on CD SEM
G. Lorusso, L. Capodieci, D. Stoler, B. Schulz, S. Roling, J. Schramm, C. Tabery, K. Shah, B. Singh, G. Abbott, A. Roberts, A. Azordegan, L. Heinrichs, Z. Kaliblotzky, E. Castel
Proceedings Volume 6152, 61520B (2006) https://doi.org/10.1117/12.674776
KEYWORDS: Semiconducting wafers, Metrology, Optical proximity correction, Pattern recognition, Design for manufacturing, Scanning electron microscopy, Calibration, Computer aided design, Resolution enhancement technologies, Algorithm development
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