Dr. Gerry Triani Profile

Dr. Gerry Triani

at ANSTO

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 30 December 2008 Paper

Atomic layer deposition of SIO2 on porous alumina membranes: controlling the pore size and transport properties

Leonora Velleman, Gerry Traini, Peter Evans, Armand Atanacio, Joe Shapter, Dusan Losic

Proceedings Volume 7267, 72670S (2008) https://doi.org/10.1117/12.810716

KEYWORDS: Atomic layer deposition, Silica, Scanning electron microscopy, Molecules, Chemistry, Coating, Ions, Biosensing, Self-assembled monolayers, Silicon

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Proceedings Article | 10 September 2008 Paper

Multilayer alumina and titania optical coatings prepared by atomic layer deposition

Nemo Biluš Abaffy, Peter Evans, Gerry Triani, Dougal McCulloch

Proceedings Volume 7041, 704109 (2008) https://doi.org/10.1117/12.794618

KEYWORDS: Atomic layer deposition, Optical coatings, Multilayers, Transmission electron microscopy, Silicon, Crystals, Reflectivity, Optical properties, Antireflective coatings, Titanium dioxide

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Proceedings Article | 20 August 2005 Paper

Atomic layer deposition of TiO2 / Al2O3 films for optical applications

Gerry Triani, Peter Evans, David Mitchell, Darren Attard, Kim Finnie, Michael James, Tracey Hanley, Bruno Latella, Kathryn Prince, John Bartlett

Proceedings Volume 5870, 587009 (2005) https://doi.org/10.1117/12.638039

KEYWORDS: Atomic layer deposition, Aluminum, Silicon, Transmission electron microscopy, Silicon films, Refractive index, Glasses, Interfaces, X-rays, Dielectrics

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Proceedings Article | 2 April 2004 Paper

Atomic layer deposition (ALD) of TiO2 and Al2O3 thin films on silicon

David Mitchell, Gerry Triani, Darren Attard, Kim Finnie, Peter Evans, Christophe Barbe, John Bartlett

Proceedings Volume 5276, (2004) https://doi.org/10.1117/12.531795

KEYWORDS: Atomic layer deposition, Thin films, Silicon, Silicon films, Multilayers, Microelectromechanical systems, Microelectronics, Photonics, Metals, Titanium dioxide

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Proceedings Article | 2 April 2004 Paper

Characterization of thin metal oxide films grown by atomic layer deposition

Peter Evans, Kathryn Prince, Gerry Triani, Kim Finnie, David Mitchell, Christophe Barbe

Proceedings Volume 5276, (2004) https://doi.org/10.1117/12.524052

KEYWORDS: Aluminum, Atomic layer deposition, Silicon, Thin films, Microelectromechanical systems, Metals, Multilayers, Oxides, Ions, Chlorine

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