Dr. Gerhard Kunkel Profile

Dr. Gerhard Kunkel

at Qimonda Dresden GmbH & Co OHG

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Author

Publications (11)

Proceedings Article | 23 March 2006 Paper

Influence of mask manufacturing process on printing behavior of angled line structures

Silvio Teuber, Arndt Dürr, Holger Herguth, Gerhard Kunkel, Timo Wandel, Thomas Zell

Proceedings Volume 6154, 61544C (2006) https://doi.org/10.1117/12.657070

KEYWORDS: Photomasks, Line edge roughness, Line width roughness, Printing, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Manufacturing, Electron beams, Inspection

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Proceedings Article | 12 May 2005 Paper

Long-term Zernike lens aberration measurement

Patrick Lomtscher, Gerhard Kunkel, Bill Roberts

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598738

KEYWORDS: Monochromatic aberrations, Semiconducting wafers, Interferometers, Reticles, Projection systems, Lithography, Phase shifts, Metrology, Wavefronts, Diffraction gratings

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Proceedings Article | 28 May 2004 Paper

Optimization and characterization of the blazed phase grating focus monitoring technique

William Roberts, Gerhard Kunkel

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535332

KEYWORDS: Scanners, Semiconducting wafers, Reticles, Diffraction, Interferometers, Optical design, Manufacturing, Microscopes, Control systems, Neodymium

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Proceedings Article | 28 May 2004 Paper

Method to improve the resolution of contact holes

Gerhard Kunkel, Ralf Ziebold

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535246

KEYWORDS: Photomasks, Optical lithography, Resolution enhancement technologies

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Proceedings Article | 26 June 2003 Paper

Exposure field size considerations for yield

Uwe Schroeder, Gerhard Kunkel

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485483

KEYWORDS: Lithography, Critical dimension metrology, Capacitors, Overlay metrology, Reticles, Semiconducting wafers, Semiconductor manufacturing, Tolerancing, Image registration, Deep ultraviolet

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Proceedings Article | 14 September 2001 Paper

Aberration measurement using in-situ two-beam interferometry

Joseph Kirk, Gerhard Kunkel, Alfred Wong

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435717

KEYWORDS: Monochromatic aberrations, Reticles, Wavefronts, Interferometry, Microscopes, Photoresist materials, Charge-coupled devices, Optical microscopes, Zernike polynomials, Process control

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Proceedings Article | 14 September 2001 Paper

How lens aberrations influence lithographic imaging and how to reduce their effects

Gerhard Kunkel, Wolfgang Henke, Ina Voigt

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435679

KEYWORDS: Diffraction, Photomasks, Lithography, Image analysis, Critical dimension metrology, Monochromatic aberrations, Projection systems, Optical lithography, Optical proximity correction, Scanners

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Proceedings Article | 5 July 2000 Paper

Double exposure technique to reduce line shortening and improve pattern fidelity

Gerhard Kunkel, Scott Bukofsky, Shahid Butt, Zhijian Lu

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388943

KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Double patterning technology, Resolution enhancement technologies, Diffraction, Light sources, Manufacturing, Lithographic illumination, Image processing

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Proceedings Article | 11 June 1999 Paper

Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography

Zhijian Lu, Yuping Cui, Alan Thomas, Scott Mansfield, Gerhard Kunkel, David Dobuzinsky, Franz Zach, Daniel Liu, K. Rex Chen, George Jordhamo, Alois Gutmann, Timothy Farrell

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350280

KEYWORDS: Printing, Etching, Photomasks, Oxides, Phase shifts, Lithography, Optical lithography, Optical properties, Electroluminescence, Resistance

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Proceedings Article | 2 July 1994 Paper

Correlation of current-voltage characteristics of step-edge YBa2Cu3O7 Josephson junctions with the step angle

K. Herrmann, Michael Siegel, Gerhard Kunkel, A. Thust, B. Kabius, C. Jia, Juergen Schubert, Alex Braginski

Proceedings Volume 2160, (1994) https://doi.org/10.1117/12.181010

KEYWORDS: Niobium, Ions, Ion beams, Transmission electron microscopy, Argon, Etching, Optical lithography, Scanning electron microscopy, Photoresist materials, Magnetism

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Proceedings Article | 2 July 1994 Paper

Comparison of Josephson radiation properties of different YBa2Cu3O7 thin film junctions

Gerhard Kunkel, M. Bode, F. Wang, M. Faley, Michael Siegel, Willi Zander, Juergen Schubert, Ulrich Poppe, Alex Braginski

Proceedings Volume 2160, (1994) https://doi.org/10.1117/12.181011

KEYWORDS: Data modeling, Thin films, Temperature metrology, Resistance, Radiometry, Interferometers, Sputter deposition, Microwave radiation, Gold, Switching

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Showing 5 of 11 publications

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