Mr. Frank Staals Profile

Frank Staals

System Engineer

SPIE Involvement:

Author

Area of Expertise:

Lithography , Focus , Imaging

Publications (7)

Proceedings Article | 20 March 2020 Presentation + Paper

Novel on-product focus metrology for EUV enabling direct focus monitoring and control for EUV systems

Inbeom Yim, Koshiba Dakeshi, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Jenny Yueh, Ali Ghavami, Bart Segers, Miguel Garcia Granda, Yutao Gui, Eric Janda, Frank Staals, Se-Hui Lee, Seung-Bin Yang, Yoon-Tae Lee, Se-Ra Jeon, Daniel Park, Ewoud van West, Elliott McNamara

Proceedings Volume 11325, 113251U (2020) https://doi.org/10.1117/12.2553246

KEYWORDS: Metrology, Extreme ultraviolet, Semiconducting wafers, Control systems, Scanners, Logic, Extreme ultraviolet lithography, Deep ultraviolet, Diffraction

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Proceedings Article | 16 March 2016 Paper

Verification and application of multi-source focus quantification

J.-G. Simiz, T. Hasan, F. Staals, B. Le-Gratiet, W. Tel, C. Prentice, J.-W. Gemmink, A. Tishchenko, Y. Jourlin

Proceedings Volume 9781, 97810S (2016) https://doi.org/10.1117/12.2219143

KEYWORDS: Scanners, Design for manufacturability, Manufacturing, Product engineering, Reticles, Visualization, Image resolution, Chemical mechanical planarization, Sensors, Time metrology, Data modeling, Semiconducting wafers, Optical lithography, Performance modeling, Photomasks

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Proceedings Article | 8 March 2016 Paper

Improving focus performance at litho using diffraction-based focus metrology, novel calibration methods, interface, and control loop

Jiarui Hu, Y. L. Chen, K. H. Chen, Brian Lee, Frankie Tsai, C. M. Ke, C. H. Liao, Desmond Ngo, Benny Gosali, Robin Tijssen, Vincent Huang, Ward Tu, Marc Noot, Maryana Escalante Marun, Christian Leewis, Carlo Luijten, Frank Staals, Martijn Van Veen, Francois Furthner, Stuart Young, Kaustuve Bhattacharyya

Proceedings Volume 9778, 977829 (2016) https://doi.org/10.1117/12.2220373

KEYWORDS: Metrology, Calibration, Scanners, Process control, Interfaces, Optical lithography, Semiconducting wafers, Photoresist materials, Finite element methods, Inspection, Data modeling, Diffraction

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Proceedings Article | 4 September 2015 Paper

Product layout induced topography effects on intrafield levelling

J.-G. Simiz, T. Hasan, F. Staals, B. Le-Gratiet, W. Tel, C. Prentice, A. Tishchenko

Proceedings Volume 9661, 96610R (2015) https://doi.org/10.1117/12.2194079

KEYWORDS: Scanners, Semiconducting wafers, Polonium, Logic, Sensors, Printing, Photomasks, Electroluminescent displays, Product engineering, Optical lithography

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Proceedings Article | 19 March 2015 Paper

Predictability and impact of product layout induced topology on across-field focus control

J.-G. Simiz, T. Hasan, F. Staals, B. Le-Gratiet, P. Gilgenkrantz, A. Villaret, F. Pasqualini, W. Tel, C. Prentice, A. Tishchenko

Proceedings Volume 9424, 94241C (2015) https://doi.org/10.1117/12.2085283

KEYWORDS: Semiconducting wafers, Scanners, Sensors, Data modeling, Finite element methods, Silicon, Wafer-level optics, Convolution, Photomasks, Chemical mechanical planarization

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Proceedings Article | 19 March 2015 Paper

Intra-field patterning control using high-speed and small-target optical metrology of CD and focus

Hugo Cramer, Stefan Petra, Bastiaan Onne Fagginger Auer, Henk-Jan Smilde, Baukje Wisse, Steven Welch, Stefan Kruijswijk, Paul Hinnen, Bart Segers, Christian Leewis, Frank Staals, Maryana Escalante Marun, Stuart Young, Wei Guo, Arie den Boef

Proceedings Volume 9424, 94241F (2015) https://doi.org/10.1117/12.2085957

KEYWORDS: Semiconducting wafers, Metrology, Etching, Critical dimension metrology, Scanners, Scatterometry, Optical lithography, Optical metrology, Computer simulations, Overlay metrology

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Proceedings Article | 23 March 2011 Paper

Advanced wavefront engineering for improved imaging and overlay applications on a 1.35 NA immersion scanner

Frank Staals, Alena Andryzhyieuskaya, Hans Bakker, Marcel Beems, Jo Finders, Thijs Hollink, Jan Mulkens, Angelique Nachtwein, Rob Willekers, Peter Engblom, Toralf Gruner, Youping Zhang

Proceedings Volume 7973, 79731G (2011) https://doi.org/10.1117/12.880759

KEYWORDS: Wavefronts, Photomasks, Scanners, Source mask optimization, Optimization (mathematics), Semiconducting wafers, 3D acquisition, Reticles, Computational lithography, 3D image processing

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Showing 5 of 7 publications

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