Dr. Frank-Michael Kamm Profile

Dr. Frank-Michael Kamm

Sr Engineer R&D at Qimonda Dresden GmbH & Co OHG

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Author

Publications (11)

Proceedings Article | 29 March 2006 Paper

Evaluation of most recent chemically amplified resists for high resolution direct write using a Leica SB350 variable shaped beam writer

Anatol Schwersenz, Dirk Beyer, Monika Boettcher, Kang-Hoon Choi, Ulrich Denker, Christoph Hohle, Mathias Irmscher, Frank-Michael Kamm, Karl-Heinz Kliem, Johannes Kretz, Holger Sailer, Frank Thrum

Proceedings Volume 6153, 615347 (2006) https://doi.org/10.1117/12.655497

KEYWORDS: Semiconducting wafers, Photomasks, Optical lithography, Chemically amplified resists, Photoresist processing, Electron beam lithography, Beam shaping, Prototyping, Coating, Lithography

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Proceedings Article | 23 March 2006 Paper

Defect printability study using EUV lithography

Christian Holfeld, Karsten Bubke, Falk Lehmann, Bruno La Fontaine, Adam Pawloski, Siegfried Schwarzl, Frank-Michael Kamm, Thomas Graf, Andreas Erdmann

Proceedings Volume 6151, 61510U (2006) https://doi.org/10.1117/12.656386

KEYWORDS: Photomasks, Semiconducting wafers, Printing, Photoresist processing, Extreme ultraviolet lithography, Image processing, Scanning electron microscopy, Extreme ultraviolet, Lithography, Projection systems

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Proceedings Article | 6 May 2005 Paper

Comparison of EUV mask architectures by process window analysis

Siegfried Schwarzl, Frank-Michael Kamm, Stefan Hirscher, Klaus Lowack, Wolf-Dieter Domke, Markus Bender, Stefan Wurm, Adam Pawloski, Bruno La Fontaine, Christian Holfeld, Uwe Dersch, Florian Letzkus, Joerg Butschke

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599343

KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Multilayers, Printing, Scanning electron microscopy, Cadmium, Extreme ultraviolet lithography, Binary data, Imaging systems

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Proceedings Article | 6 December 2004 Paper

Comparative study of mask architectures for EUV lithography

Adam Pawloski, Bruno La Fontaine, Harry Levinson, Stefan Hirscher, Siegfried Schwarzl, Klaus Lowack, Frank-Michael Kamm, Markus Bender, Wolf-Dieter Domke, Christian Holfeld, Uwe Dersch, Patrick Naulleau, Florian Letzkus, Joerg Butschke

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569289

KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Reflectors, Cadmium, Critical dimension metrology, Photoresist materials, Scanning electron microscopy

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Proceedings Article | 2 June 2004 Paper

Optimized processes and absorber-stack materials for EUV masks

Josef Mathuni, Jenspeter Rau, Frank-Michael Kamm, Guenther Ruhl, Ch. Holfeld, Florian Letzkus, C. Koepernik, Joerg Butschke

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568010

KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Chromium, Tantalum, Critical dimension metrology, Materials processing, Extreme ultraviolet lithography, Reflectivity, Semiconducting wafers

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Proceedings Article | 28 August 2003 Paper

Development of a plasma etch process for TaN absorber patterning on EUV masks

Guenther Ruhl, Josef Mathuni, Dirk Knobloch, Frank-Michael Kamm, Jenspeter Rau, Florian Letzkus, Reinhard Springer

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504243

KEYWORDS: Etching, Polymers, Plasma etching, Photomasks, Plasma, Extreme ultraviolet, Scanning electron microscopy, Photoresist processing, Chromium, Diffractive optical elements

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Proceedings Article | 28 May 2003 Paper

Mask CD characterization with EUV reflectometry at the electron storage ring BESSY II

Albrecht Ehrmann, Jenspeter Rau, Andreas Wolter, Frank-Michael Kamm, Josef Mathuni, Frank Scholze, Johannes Tummler, Gerhard Ulm

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.514961

KEYWORDS: Extreme ultraviolet, Reflectivity, Photomasks, Compact discs, Scanning electron microscopy, Scatterometry, Sensors, Diffraction, Cadmium, Computer simulations

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Proceedings Article | 16 August 2002 Paper

EUV mask development: material and process

Jenspeter Rau, Hermann Wendt, Josef Mathuni, Christoph Stepper, Albrecht Ehrmann, Frank-Michael Kamm

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479358

KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Quartz, Signal processing, Tantalum, Silicon, Inspection, Chromium, Extreme ultraviolet

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Proceedings Article | 16 August 2002 Paper

Measures to achieve 20nm IPL stencil mask distortion

Ernst Haugeneder, A. Chalupka, T Lammer, Hans Loeschner, Frank-Michael Kamm, Thomas Struck, Albrecht Ehrmann, Rainer Kaesmaier, Andreas Wolter, Joerg Butschke, Mathias Irmscher, Florian Letzkus, Reinhard Springer

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479353

KEYWORDS: Photomasks, Semiconducting wafers, Distortion, Silicon, Ion beams, Electrodes, Ions, Wafer bonding, Manufacturing, Projection lithography

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Proceedings Article | 20 August 2001 Paper

Progress in placement control for ion beam stencil mask technology

Frank-Michael Kamm, Albrecht Ehrmann, Thomas Struck, Karl Kragler, Joerg Butschke, Florian Letzkus, Reinhard Springer, Ernst Haugeneder

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436673

KEYWORDS: Photomasks, Semiconducting wafers, Ions, Etching, Projection lithography, Boron, Carbon, Beam controllers, Ion beams, Optical lithography

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Proceedings Article | 9 April 2001 Paper

Progress in placement control for ion beam stencil mask technology

Frank-Michael Kamm, Albrecht Ehrmann, Thomas Struck, Karl Kragler, Joerg Butschke, Florian Letzkus, Reinhard Springer, Ernst Haugeneder, Artur Degen, Jens Voigt, Martin Kratzenberg, Ivo Rangelow

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425098

KEYWORDS: Photomasks, Ions, Semiconducting wafers, Carbon, Oxides, Lithography, Beam controllers, Ion beams, Ion implantation, Deposition processes

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Showing 5 of 11 publications

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