Mr. Fergo Treska Profile

Fergo Treska

at imec

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Publications (3)

Proceedings Article | 23 November 2024 Paper

The influence of reflectivity on EUV lithography performance of low-n and binary masks for random logic via implementation

Ling Ee Tan, Fergo Treska, Werner Gillijns, Jeroen Van de Kerkhove, Peter De Bisschop, Vicky Philipsen, Ryoung-han Kim

Proceedings Volume 13216, 132161C (2024) https://doi.org/10.1117/12.3034348

KEYWORDS: Photomasks, Reflectivity, Semiconducting wafers, Printing, Design, Source mask optimization, Logic, Optical proximity correction, Nanoimprint lithography, Extreme ultraviolet lithography

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Proceedings Article | 28 April 2023 Presentation + Paper

EUV single patterning validation of curvilinear routing

Fergo Treska, Dongbo Xu, Yasser Sherazi, Werner Gillijns

Proceedings Volume 12494, 124940I (2023) https://doi.org/10.1117/12.2654633

KEYWORDS: Design and modelling, Extreme ultraviolet, Semiconducting wafers, Metals, Edge roughness, SRAF, Printing, Optical lithography, Scanning electron microscopy, Extreme ultraviolet lithography, Optical proximity correction

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Proceedings Article | 25 May 2022 Presentation + Paper

EUV based multi-patterning schemes for advanced DRAM nodes

Sayantan Das, Kaushik Sah, Roberto Fallica, Zhijin Chen, Sandip Halder, Andrew Cross, Danilo De Simone, Fergo Treska, Philippe Leray, Ryoung Han Kim, Ethan Maguire, Chih-I Wei, Germain Fenger, Neal Lafferty, Jeonghoon Lee

Proceedings Volume 12055, 1205503 (2022) https://doi.org/10.1117/12.2615644

KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Optical lithography, Double patterning technology

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