Unspecified Fahong Li Profile

Fahong Li

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Publications (5)

Proceedings Article | 10 April 2024 Presentation + Paper

Feature grouping to enable edge placement error-aware process control in multi-feature logic use case

Guillaume Schelcher, Marsil Athayde, Stijn Schoofs, Jeff Hsia, Zuan Khalik, Fahong Li, Konstantin Nechaev, Reza Sahraeian, Amir-Hossein Tamaddon, Victor Blanco, Stefan van der Sanden, Yichen Zhang, Roy Anunciado, Harm Dillen, Philippe Leray

Proceedings Volume 12955, 129550O (2024) https://doi.org/10.1117/12.3010421

KEYWORDS: Semiconducting wafers, Overlay metrology, Cross validation, Process control, Logic, Metrology, Simulations, Scanning electron microscopy, Lithography

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Proceedings Article | 28 September 2021 Presentation

Contour-based variability decomposition for stochastic band metrology

Thomas Wallow, Jiyou Fu, Jiao Liang, Jen-Shiang Wang, Jimmy Fan, Maxence Delorme, ChangAn Wang, Fahong Li, Vivek Jain, Rui Yuan

Proceedings Volume 11854, 118540E (2021) https://doi.org/10.1117/12.2601587

KEYWORDS: Metrology, Stochastic processes, Photomasks, Model-based design, Scanning electron microscopy, Line edge roughness, Optical lithography, Semiconducting wafers, Extreme ultraviolet, Wafer-level optics

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Proceedings Article | 5 April 2012 Paper

High-speed, full 3D feature metrology for litho monitoring, matching, and model calibration with scatterometry

Hugo Cramer, Alek Chen, Fahong Li, Philippe Leray, Anne-Laure Charley, Lieve van Look, Joost Bekaert, Shaunee Cheng

Proceedings Volume 8324, 83240R (2012) https://doi.org/10.1117/12.919050

KEYWORDS: Scatterometry, Scanners, 3D modeling, Optical proximity correction, 3D metrology, Calibration, Metrology, Lithography, Scatter measurement, Scanning electron microscopy

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Proceedings Article | 30 September 2011 Paper

3D features measurement using YieldStar: an angle resolved polarized scatterometer

Anne-Laure Charley, Philippe Leray, Koen D'havé, Shaunee Cheng, Paul Hinnen, Fahong Li, Peter Vanoppen, Mircea Dusa

Proceedings Volume 8169, 81690Q (2011) https://doi.org/10.1117/12.897582

KEYWORDS: 3D metrology, Scatterometry, Critical dimension metrology, Metrology, Lithography, 3D modeling, Optical proximity correction, Diffraction, Calibration, Scatter measurement

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Proceedings Article | 20 April 2011 Paper

3D features measurement using YieldStar, an angle resolved polarized scatterometer

Anne-Laure Charley, Philippe Leray, Koen D'havé, Shaunee Cheng, Paul Hinnen, Fahong Li, Peter Vanoppen, Mircea Dusa

Proceedings Volume 7971, 79712E (2011) https://doi.org/10.1117/12.881276

KEYWORDS: 3D metrology, Metrology, Critical dimension metrology, Lithography, Scatterometry, Scanning electron microscopy, Scatter measurement, 3D modeling, Optical proximity correction, Process control

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