Dr. Elio Giuseppe De Chiara Profile

Dr. Elio Giuseppe De Chiara

at STMicroelectronics

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Author

Publications (4)

Proceedings Article | 4 March 2010 Paper

CD-uniformity for 45nm NV memory on product-stack

Umberto Iessi, Brian Colombo, Johannes Plauth, Benedetta Triulzi, Elio De Chiara, Paolo Canestrari

Proceedings Volume 7640, 76403I (2010) https://doi.org/10.1117/12.846538

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanners, Thin films, Reticles, Statistical analysis, Thin film devices, Wafer-level optics, 193nm lithography, Lithography

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Proceedings Article | 4 March 2010 Paper

Laser bandwidth effect on overlay budget and imaging for the 45 nm and 32nm technology nodes with immersion lithography

Umberto Iessi, Michiel Kupers, Elio De Chiara, Pierluigi Rigolli, Ivan Lalovic, G. Capetti

Proceedings Volume 7640, 76402B (2010) https://doi.org/10.1117/12.846552

KEYWORDS: Laser stabilization, Optical simulations, Overlay metrology, Chromatic aberrations, Laser applications, Lithography, Metrology, Distortion, Immersion lithography, Critical dimension metrology

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Proceedings Article | 16 March 2009 Paper

High-order distortion effects induced by extreme off-axis illuminations at hyper NA lithography

Pierluigi Rigolli, Gianfranco Capetti, Elio De Chiara, Leonardo Amato, Umberto Iessi, Paolo Canestrari, Christine Llorens, Sanne Smit, Lionel Brige, Johannes Plauth

Proceedings Volume 7274, 72742T (2009) https://doi.org/10.1117/12.814148

KEYWORDS: Overlay metrology, Lithographic illumination, Distortion, Lithography, Semiconducting wafers, Device simulation, Reticles, Yield improvement, Scanners, Wavefronts

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Proceedings Article | 7 March 2008 Paper

Double patterning overlay and CD budget for 32 nm technology node

Umberto Iessi, Sara Loi, Antonio Salerno, Pierluigi Rigolli, Elio De Chiara, Catia Turco, Roberto Colombo, Marco Polli, Antonio Mani

Proceedings Volume 6924, 692428 (2008) https://doi.org/10.1117/12.772795

KEYWORDS: Photomasks, Overlay metrology, Semiconducting wafers, Double patterning technology, Etching, Scanners, Metrology, Optical alignment, Lithography, Optical lithography

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