In the last couple of decades huge effort has been put into development of photonics platforms based on various materials such as Si, Si3N4, InP, LiNbO3, GaAs and others. Only few of them (Si, Si3N4, InP) have turned into eco-systems resembling semiconductors industry of design house, foundries, fabless companies and multi project wafer (MPW) services of photonics integrated circuits (PICs). While various photonic platforms have matured to industrial level, they still have numerous challenges including limits set by material properties, expensive fabrication and complicated hybrid integration.
Polymer materials provide numerous advantages over semiconductor and oxide/nitride platforms: combination of passive and active elements, simple fabrication techniques, Integration of other elements for hybrid platform, wide wavelength range and multilayer structure.
We will present the results of developed polymer photonic platform with active and passive elements based on SU-8 and polymethylmethacrylate photoresist.
Ocular aberrations can be corrected with wavefront correctors created in a photoresist layer. The simplest type of the mask used in optical lithography is a binary amplitude mask. It is known that such a mask has a periodic hole pattern. The purpose of this research was to assess applicability of a binary amplitude mask for creating ocular wavefront correctors. The photoresist was applied to the substrate by using the dip-coating method. The photoresist layer was illuminated through a mask printed on a transparent film by using a laser printer. The surface of the wavefront correctors was evaluated by aberrometry, scanning electron microscopy and profilometry method. The dip-coating method can be used to apply an uniform photoresist layer on the substrate. Despite rapid variations in the surface depth the required shape of the wavefronts can still be obtained. Because of strong light scattering the wavefront correctors manufactured by using a binary amplitude mask aren't suited for studying visual functions. However, the wavefront correctors manufactured by such a type of the mask may be used for calibration of aberrometers.
SHG efficiency of the poled guest - host polymer system is proportional to the concentration and orientation degree of
NLO active molecules (chromophores). Corona poling realized at elevated temperatures could cause concentration
decrease of NLO- active molecules due to centrosymmetric crystallization. Our studies showed that number density of
crystallites is depending on orientation procedure. To obtain the best orientation procedure for guest - host systems
containing four different chromophores based on dimethylaminobenzylidene 1, 3 - indandione we have compared
optical images and SHG efficiency of corona poled films. According to our observations external poling electric field
applied from the very beginning of the sample heating process can reduce crystallite grow. The optical quality is
improved and SHG efficiency in some cases is up to 1.6 (depending on molecule structure) times larger after our
suggested orientation sequence compared to classic corona poling procedures.
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