Metal-insulator-metal (MIM) diodes are highly considered in high frequency applications in form of rectennas for energy harvesting applications due to their fast speed, small size, and ease of fabrication and IC compatibility. In these diodes, insulators are integral part of the device, determining performance parameters. In this study, we have evaluated HfO2 and Al2O3 based MIM diode structures to compare and determine performance parameters, with conversion efficiency being prioritized. The fabrication processes in physical vapor deposition (PVD) systems for the MIM diodes resulted in the devices having high non-linearity and responsivity. Also, to achieve uniform and very thin insulator layer atomic layer deposition (ALD) was used. We implemented the same MIM structure in 10x10 array form, with active area of 200x325 nm2. The efficiency values of same arrays tested with 1200 and 1600 nm wavelength LEDs for 200x325 nm2 diode active area without applying bias. The conversion efficiency value of the HfO2 based structures calculated as 5% for 1200 nm wavelength. These measured values of conversion efficiency are reported for the first time in the literature for MIM diodes in SWIR operation.
The metal-insulator-metal (MIM) diodes have high speed and compatibility with integrated circuits (IC’s) making MIM diodes very attractive to detect and harvest energy for infrared (IR) regime of the electromagnetic spectrum. Due to the fact that small size of the MIM diodes, it is possible to obtain large volume of devices in same unit area. Hence, MIM diodes offer a feasible solution for nanorectennas (nano rectifiying antenna) in IR regime. The aim of this study is to design and develop MIM diodes as array format coupled with antennas for energy harvesting and IR detection. Moreover, varying number of elements which are 4x4, and 40x30 has been fabricated in parallel having 0.040, 0.065 and 0.080 μm2 diode area. For this work we have studied given type of material; Ti-HfO2-Ni, is used for fabricating MIM diodes as a part of rectenna. The effect of the diode array size is investigated. Furthermore, the effect of the array size is also investigated for larger arrays by applying given type of material set; Cr-HfO2-Ni. The fabrication processes in physical vapor deposition (PVD) systems for the MIM diodes resulted in the devices having high non-linearity and responsivity. Also, to achieve uniform and very thin insulator layer atomic layer deposition (ALD) was used. The nonlinearity 1.5 mA/V2 and responsivity 3 A/W are achieved for Ti-HfO2-Ni MIM diodes under low applied bias of 400 mV. The responsivity and nonlinearity of Cr-HfO2-Ni are found to be 5 A/W and 65 μA/V2, respectively. The current level of Cr-HfO2-Ni and Ti-HfO2-Ni is around μA range therefore corresponding resistance values are in 1-10 kΩ range. The comparison of single and 4x4 elements revealed that 4x4 elements have higher current level hence lower resistance value is obtained for 4x4 elements. The array size is 40x30 elements for Cr-HfO2-Ni type of MIM diodes with 40, 65 nm2 diode areas. By increasing the diode area, the current level increases for same size of array. The current level is increased from10 μA to100 μA with increasing the diode area. Therefore resistance decreased in the range of 10 kΩ and nonlinearity is increased from 58 μA/V2 to 65 μA/V2.
A prototype of a readout IC (ROIC) designed for use in high temperature coefficient of resistance (TCR) SiGe microbolometers is presented. The prototype ROIC architecture implemented is based on a bridge with active and blind bolometer pixels with a capacitive transimpedance amplifier (CTIA) input stage and column parallel integration with serial readout. The ROIC is designed for use in high (≥ 4 %/K) TCR and high detector resistance Si/SiGe microbolometers with 17x17 μm2 pixel sizes in development. The prototype has been designed and fabricated in 0.25- μm SiGe:C BiCMOS process.
The metal-insulator-metal (MIM) diodes are considered to be very attractive candidate for infrared energy harvesting and detection applications. The high speed and compatibility with integrated circuits (IC’s) makes MIM diodes good choice for infrared (IR) regime of the electromagnetic spectrum. Moreover, it is possible to obtain large volume of devices in same unit area due to smaller active area required for MIM diodes. The aim of this work is to design and develop MIM diodes for energy harvesting and IR detection. For this work three different sets of materials; Au-Al2O3-Al, Au-Cr2O3-Cr, Au-TiO2-Ti Al2O3, are used for fabricating MIM diodes. Furthermore, the effect of the insulator thickness and diode active areas are investigated for Au-Al2O3-Al MIM diode to study diode characteristics further. The optimization of fabrication processes in physical vapor deposition (PVD) systems for the MIM diodes resulted in the devices having high non-linearity and responsivity. The non-linearity of 80 μA/V2 and a responsivity of 15 A/W are achieved for Al-Al2O3-Au MIM diodes under low applied bias of 50 mV. The responsivity of Au-Cr2O3-Cr and Au-TiO2-Ti diodes with insulating layers of Cr2O3 and TiO2 are found to be 8 A/W and 2 A/W respectively.
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