Dr. Eberhard Adolf Spiller Profile

Dr. Eberhard Adolf Spiller

Retired

SPIE Involvement:

Author

Publications (61)

Proceedings Article | 5 June 2018 Paper

Aperiodic x-ray multilayer interference coatings with high reflectance and large field of view

Catherine Burcklen, Tom Pardini, Jennifer Alameda, Jeff Robinson, Eberhard Spiller, Chris Walton, Paul Mirkarimi, Stefan Hau-Riege, Regina Soufli

Proceedings Volume 10691, 106910U (2018) https://doi.org/10.1117/12.2314257

KEYWORDS: Reflectivity, Multilayers, Silicon, Interfaces, X-rays, Molybdenum, Silicon carbide, Data modeling, Systems modeling

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Proceedings Article | 17 April 2014 Paper

Projection optics for EUVL micro-field exposure tools with 0.5 NA

Holger Glatzel, Dominic Ashworth, Dan Bajuk, Matt Bjork, Mark Bremer, Mark Cordier, Kevin Cummings, Luc Girard, Michael Goldstein, Eric Gullikson, Samuel Hardy, Russ Hudyma, James Kennon, Robert Kestner, Lou Marchetti, Keyvan Nouri, Patrick Naulleau, Daniel Pierce, Regina Soufli, Eberhard Spiller, Yogesh Verma

Proceedings Volume 9048, 90481K (2014) https://doi.org/10.1117/12.2048643

KEYWORDS: Mirrors, Metrology, Wavefronts, Projection systems, Aspheric lenses, Extreme ultraviolet, Extreme ultraviolet lithography, Optical coatings, Lithography, Optical fabrication

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SPIE Journal Paper | 6 September 2013

Multisegmented, multilayer-coated mirrors for the Solar Ultraviolet Imager

Dennis Martínez-Galarce, Regina Soufli, David Windt, Marilyn Bruner, Eric Gullikson, Shayna Khatri, Eberhard Spiller, Jeffrey Robinson, Sherry Baker, Evan Prast

OE, Vol. 52, Issue 09, 095102, (September 2013) https://doi.org/10.1117/12.10.1117/1.OE.52.9.095102

KEYWORDS: Mirrors, Extreme ultraviolet, Reflectivity, Multilayers, Imaging systems, Ultraviolet radiation, Optical coatings, EUV optics, Spatial frequencies, Optical engineering

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Proceedings Article | 1 April 2013 Paper

Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5

Holger Glatzel, Dominic Ashworth, Mark Bremer, Rodney Chin, Kevin Cummings, Luc Girard, Michael Goldstein, Eric Gullikson, Russ Hudyma, Jim Kennon, Bob Kestner, Lou Marchetti, Patrick Naulleau, Regina Soufli, Eberhard Spiller

Proceedings Volume 8679, 867917 (2013) https://doi.org/10.1117/12.2012698

KEYWORDS: Mirrors, Multilayers, Wavefronts, Extreme ultraviolet lithography, Aspheric lenses, Metrology, Extreme ultraviolet, Projection systems, Lithography, Optical testing

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Proceedings Article | 15 October 2012 Paper

Microroughness measurements and EUV calibration of the solar ultraviolet imager multilayer-coated mirrors

Dennis Martínez-Galarce, Regina Soufli, David Windt, Marilyn Bruner, Eric Gullikson, Shayna Khatri, Eberhard Spiller, Jeff Robinson, Sherry Baker, Evan Prast

Proceedings Volume 8501, 85010I (2012) https://doi.org/10.1117/12.953571

KEYWORDS: Mirrors, Extreme ultraviolet, Reflectivity, Multilayers, Spatial frequencies, EUV optics, Calibration, Optical coatings, Space telescopes, Telescopes

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Proceedings Article | 17 September 2012 Paper

In-band and out-of-band reflectance calibrations of the EUV multilayer mirrors of the atmospheric imaging assembly instrument aboard the Solar Dynamics Observatory

Regina Soufli, Eberhard Spiller, David Windt, Jeff Robinson, Eric Gullikson, Luis Rodriguez-de Marcos, Monica Fernandez-Perea, Sherry Baker, Andrew Aquila, Franklin Dollar, José Antonio Méndez , Juan Larruquert, Leon Golub, Paul Boerner

Proceedings Volume 8443, 84433C (2012) https://doi.org/10.1117/12.927274

KEYWORDS: Reflectivity, Mirrors, Multilayers, Extreme ultraviolet, Statistical modeling, Calibration, Data modeling, Silicon, Space telescopes, Silicon carbide

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Proceedings Article | 27 May 2009 Paper

Ion beam deposition for defect-free EUVL mask blanks

Patrick Kearney, C. C. Lin, Takashi Sugiyama, Henry Yun, Rajul Randive, Ira Reiss, Alan Hayes, Paul Mirkarimi, Eberhard Spiller

Proceedings Volume 7470, 74700X (2009) https://doi.org/10.1117/12.835195

KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Ion beams, Inspection, Extreme ultraviolet, Deposition processes, Particles, Manufacturing, Ions

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Proceedings Article | 18 May 2009 Paper

Sub-micron focusing of soft x-ray free electron laser beam

S. Bajt, H. Chapman, A. Nelson, R. Lee, S. Toleikis, P. Mirkarimi, J. Alameda, S. Baker, H. Vollmer, R. Graff, A. Aquila, E. Gullikson, J. Meyer Ilse, E. Spiller, J. Krzywinski, L. Juha, J. Chalupský, V. Hájková, J. Hajdu, T. Tschentscher

Proceedings Volume 7361, 73610J (2009) https://doi.org/10.1117/12.822498

KEYWORDS: Reflectivity, Carbon, Contamination, Mirrors, Plasma, Oxygen, Free electron lasers, Wavefronts, X-rays, Diffraction

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Proceedings Article | 21 March 2008 Paper

Ion beam deposition for defect-free EUVL mask blanks

Patrick Kearney, C. C. Lin, Takashi Sugiyama, Chan-Uk Jeon, Rajul Randive, Ira Reiss, Renga Rajan, Paul Mirkarimi, Eberhard Spiller

Proceedings Volume 6921, 69211X (2008) https://doi.org/10.1117/12.774505

KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Ion beams, Extreme ultraviolet, Manufacturing, Particles, Inspection, Ions, Deposition processes

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Proceedings Article | 18 May 2007 Paper

Multilayers for next-generation x-ray sources

S. Bajt, H. Chapman, E. Spiller, S. Hau-Riege, J. Alameda, A. Nelson, C. Walton, B. Kjornrattanawanich, A. Aquila, F. Dollar, E. Gullikson, C. Tarrio, S. Grantham

Proceedings Volume 6586, 65860J (2007) https://doi.org/10.1117/12.724786

KEYWORDS: Reflectivity, Mirrors, Multilayers, Free electron lasers, Silicon, X-ray optics, X-rays, X-ray sources, Coating, Optical components

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Proceedings Article | 15 March 2007 Paper

Defect mitigation and reduction in EUVL mask blanks

Rajul Randive, Andy Ma, Ira Reiss, Paul Mirkarimi, Eberhard Spiller, Bernd Beier, Toshiyuki Uno, Patrick Kearney, Chan-Uk Jeon

Proceedings Volume 6517, 651726 (2007) https://doi.org/10.1117/12.712103

KEYWORDS: Particles, Etching, Silicon, Photomasks, Extreme ultraviolet lithography, Ion beams, Atomic force microscopy, Ions, Inspection, Coating

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SPIE Journal Paper | 1 April 2006

Progress in the fabrication of low-defect density mask blanks for extreme ultraviolet lithography

Rajul Randive, Andy Ma, Patrick Kearney, David Krick, Ira Reiss, Paul Mirkarimi, Eberhard Spiller

JM3, Vol. 5, Issue 02, 023003, (April 2006) https://doi.org/10.1117/12.10.1117/1.2198853

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Multilayers, Coating, Particles, Reflectivity, Silicon, Ions, Ion beams, Quartz

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Proceedings Article | 9 November 2005 Paper

Evaluation of alternative capping layers for EUVL mask ML blank

Pei-yang Yan, Eberhard Spiller, Eric Gullikson, Shannon Hill

Proceedings Volume 5992, 59923Z (2005) https://doi.org/10.1117/12.637599

KEYWORDS: Reflectivity, Extreme ultraviolet lithography, Ruthenium, Photomasks, Ultraviolet radiation, Oxygen, Silicon, Extreme ultraviolet, Etching, Oxidation

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Proceedings Article | 15 September 2005 Paper

Development and testing of EUV multilayer coatings for the atmospheric imaging assembly instrument aboard the Solar Dynamics Observatory

Regina Soufli, David Windt, Jeffrey Robinson, Sherry Baker, Eberhard Spiller, Franklin Dollar, Andrew Aquila, Eric Gullikson, Benjawan Kjornrattanawanich, John Seely, Leon Golub

Proceedings Volume 5901, 59010M (2005) https://doi.org/10.1117/12.617370

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet, Molybdenum, Mirrors, Silicon, Iron, Telescopes, Observatories, Optical coatings

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Proceedings Article | 8 September 2005 Paper

Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems

Kenneth Goldberg, Patrick Naulleau, Senajith Rekawa, Paul Denham, J. Liddle, Eric Gullikson, Keith Jackson, Erik Anderson, John Taylor, Gary Sommargren, Henry Chapman, Donald Phillion, Michael Johnson, Anton Barty, Regina Soufli, Eberhard Spiller, Christopher Walton, Sasa Bajt

Proceedings Volume 5900, 59000G (2005) https://doi.org/10.1117/12.618066

KEYWORDS: Extreme ultraviolet, Optical testing, Interferometry, EUV optics, X-ray optics, X-rays, Lenses, Light sources, Astronomical imaging, X-ray astronomy

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Proceedings Article | 31 August 2005 Paper

Recent advances in x-ray optics

Eberhard Spiller

Proceedings Volume 5918, 591806 (2005) https://doi.org/10.1117/12.625154

KEYWORDS: X-rays, Mirrors, Multilayers, Diffraction, X-ray optics, Absorption, X-ray telescopes, Grazing incidence, Crystals, X-ray imaging

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Proceedings Article | 28 June 2005 Paper

Recent progress in the fabrication of low defect density mask blanks

Andy Ma, Patrick Kearney, Dave Krick, Rajul Randive, Ira Reiss, Paul Mirkarimi, Eberhard Spiller

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617477

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Coating, Multilayers, Reflectivity, Particles, Ions, Silicon, Molybdenum, Quartz

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Proceedings Article | 28 June 2005 Paper

New EUVL ML capping design for ML blank multiple reuses

Pei-yang Yan, Eberhard Spiller

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617483

KEYWORDS: Ruthenium, Reflectivity, Extreme ultraviolet lithography, Etching, Photomasks, Neodymium, Silicon, Molybdenum, Sputter deposition, Optical lithography

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Proceedings Article | 6 May 2005 Paper

Progress towards the development of a commercial tool and process for EUVL mask blanks

Andy Ma, Patrick Kearney, Dave Krick, Rajul Randive, Ira Reiss, Paul Mirkarimi, Eberhard Spiller

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599936

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Multilayers, Coating, Reflectivity, Particles, Silicon, Ions, Molybdenum, Lithography

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Proceedings Article | 6 May 2005 Paper

Substrate smoothing for high-temperature condenser operation in EUVL source environments

Regina Soufli, Sherry Baker, Susan Ratti, Jeff Robinson, Sasa Bajt, Jennifer Alameda, Eberhard Spiller, John Taylor, Eric Gullikson, Franklin Dollar, Andrew Aquila, Robert Bristol

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.606466

KEYWORDS: Extreme ultraviolet lithography, Aluminum, Annealing, Silicon, Atomic force microscopy, Multilayers, Reflectivity, Coating, Extreme ultraviolet, Ceramics

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Proceedings Article | 6 December 2004 Paper

Overcoming substrate defect decoration effects in EUVL mask blank development

Patrick Kearney, Rajul Randive, Andy Ma, David Krick, Al Weaver, Ira Reiss, Daniel Abraham, Paul Mirkarimi, E. Spiller

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569271

KEYWORDS: Multilayers, Extreme ultraviolet lithography, Inspection, Photomasks, Coating, Reflectivity, Deposition processes, Defect detection, Defect inspection, Quartz

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SPIE Journal Paper | 1 December 2004

Smoothing of diamond-turned substrates for extreme ultraviolet illuminators

Regina Soufli, Eberhard Spiller, Mark Schmidt, Jeffrey Robinson, Sherry Baker, Susan Ratti, Michael Johnson, Eric Gullikson

OE, Vol. 43, Issue 12, (December 2004) https://doi.org/10.1117/12.10.1117/1.1815005

KEYWORDS: Extreme ultraviolet lithography, Multilayers, Extreme ultraviolet, Reflectivity, Coating, Aluminum, Fiber optic illuminators, Optics manufacturing, Spatial frequencies, EUV optics

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Proceedings Article | 20 August 2004 Paper

Ru-capped EUVL ML mask blank performance

Pei-Yang Yan, Guojing Zhang, Eberhard Spiller, Paul Mirkarimi

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557816

KEYWORDS: Ruthenium, Reflectivity, Photomasks, Etching, Extreme ultraviolet lithography, Silicon, Optical lithography, Surface roughness, Oxides, Oxidation

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Proceedings Article | 13 January 2004 Paper

Smoothing of diamond-turned substrates for extreme-ultraviolet lithography illuminators

Regina Soufli, Eberhard Spiller, Mark Schmidt, Jeffrey Robinson, Sherry Baker, Susan Ratti, Michael Johnson, Eric Gullikson

Proceedings Volume 5193, (2004) https://doi.org/10.1117/12.509220

KEYWORDS: Extreme ultraviolet lithography, Reflectivity, Multilayers, Extreme ultraviolet, Coating, Spatial frequencies, Aluminum, Fiber optic illuminators, Optics manufacturing, Silicon

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Proceedings Article | 13 January 2004 Paper

High-performance multilayer coatings for EUV lithography

Eberhard Spiller

Proceedings Volume 5193, (2004) https://doi.org/10.1117/12.507237

KEYWORDS: Multilayers, Reflectivity, Mirrors, Ion beams, Optical coatings, Extreme ultraviolet lithography, Sputter deposition, Cameras, Ions, Extreme ultraviolet

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SPIE Journal Paper | 1 January 2004

Developing a viable multilayer coating process for extreme ultraviolet lithography reticles

Paul Mirkarimi, Eberhard Spiller, Sherry Baker, Victor Sperry, Daniel Stearns, Eric Gullikson

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1631006

KEYWORDS: Multilayers, Coating, Extreme ultraviolet lithography, Silicon, Ions, Reflectivity, Optical spheres, Etching, Particles, Gold

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Proceedings Article | 17 December 2003 Paper

Current status of next-generation EUVL mask blank tool development

Andy Ma, Kevin Kemp, Rajul Randive, Al Weaver, Mark Roberti, Alan Hayes, Daniel Abraham, Paul Mirkarimi, Eberhard Spiller, Patrick Kearney

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.535866

KEYWORDS: Reflectivity, Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Multilayers, Silicon, Coating, Quartz, Ions, Ion beams

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Proceedings Article | 17 December 2003 Paper

EUVL mask with Ru ML capping

Pei-Yang Yan, Guojing Zhang, Scott Chegwidden, Eberhard Spiller, Paul Mirkarimi

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.520024

KEYWORDS: Ruthenium, Etching, Reflectivity, Silicon, Photomasks, Extreme ultraviolet lithography, Optical lithography, Oxides, Extreme ultraviolet, Electron beam lithography

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Proceedings Article | 16 June 2003 Paper

Static EUV micro-exposures using the ETS Set-2 optics

Patrick Naulleau, Kenneth Goldberg, Erik Anderson, Jeffrey Bokor, Bruce Harteneck, Keith Jackson, Deirdre Olynick, Farhad Salmassi, Sherry Baker, Paul Mirkarimi, Eberhard Spiller, Christopher Walton, Donna O'Connell, Pei-Yang Yan, Guojing Zhang

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490129

KEYWORDS: Lithography, Extreme ultraviolet, Printing, Photomasks, EUV optics, Wafer-level optics, Semiconducting wafers, Extreme ultraviolet lithography, Mirrors, Fiber optic illuminators

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Proceedings Article | 27 December 2002 Paper

Aerial-image microscopes for the inspection of defects in EUV masks

Anton Barty, John Taylor, Russell Hudyma, Eberhard Spiller, Donald Sweeney, Gilbert Shelden, Jan-Peter Urbach

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467918

KEYWORDS: Imaging systems, Extreme ultraviolet, Photomasks, Zone plates, Microscopes, Extreme ultraviolet lithography, Objectives, Mirrors, Inspection, EUV optics

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SPIE Journal Paper | 1 August 2002

Improved reflectance and stability of Mo/Si multilayers

Sasa Bajt, Jennifer Alameda, Troy Barbee, W. Miles Clift, James Folta, Benjamin Kaufmann, Eberhard Spiller

OE, Vol. 41, Issue 08, (August 2002) https://doi.org/10.1117/12.10.1117/1.1489426

KEYWORDS: Multilayers, Reflectivity, Silicon, Interfaces, Molybdenum, Boron, Extreme ultraviolet lithography, Ruthenium, Extreme ultraviolet, Silicon carbide

Proceedings Article | 1 July 2002 Paper

Static microfield printing at the advanced light source with the ETS Set-2 optic

Patrick Naulleau, Kenneth Goldberg, Erik Anderson, David Attwood, Phillip Batson, Jeffrey Bokor, Paul Denham, Eric Gullikson, Bruce Harteneck, Brian Hoef, Keith Jackson, Deirdre Olynick, Senajith Rekawa, Farhad Salmassi, Kenneth Blaedel, Henry Chapman, Layton Hale, Regina Soufli, Eberhard Spiller, Donald Sweeney, John Taylor, Christopher Walton, Avijit Ray-Chaudhuri, Donna O'Connell, Richard Stulen, Daniel Tichenor, Charles Gwyn, Pei-yang Yan, Guojing Zhang

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472318

KEYWORDS: Printing, Extreme ultraviolet, Lithography, Fiber optic illuminators, Interferometry, Mirrors, Reticles, Modulation transfer functions, Wavefronts, Critical dimension metrology

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Proceedings Article | 11 March 2002 Paper

Multilayer coating requirements for extreme ultraviolet lithography masks

Scott Hector, Eric Gullikson, Paul Mirkarimi, Eberhard Spiller, Patrick Kearney, James Folta

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458369

KEYWORDS: Reflectivity, Multilayers, Photomasks, Coating, Mirrors, Extreme ultraviolet lithography, Semiconducting wafers, Projection systems, Silicon, Lithographic illumination

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Proceedings Article | 28 December 2001 Paper

X-ray optics and diagnostics for first experiments on the Linac Coherent Light Source (LCLS)

Alan Wootton, John Arthur, Troy Barbee, Richard Bionta, Richard London, Hye-Sook Park, Dmitri Ryutov, Eberhard Spiller, Roman Tatchyn

Proceedings Volume 4500, (2001) https://doi.org/10.1117/12.452962

KEYWORDS: Diagnostics, Liquid crystal lasers, Free electron lasers, X-rays, Light sources, X-ray optics, Plasma, Grazing incidence, Mirrors, Beryllium

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Proceedings Article | 20 December 2001 Paper

Initial results from the EUV engineering test stand

Daniel Tichenor, Avijit Ray-Chaudhuri, Sang Hun Lee, Henry Chapman, William Replogle, Kurt Berger, Richard Stulen, Glenn Kubiak, Leonard Klebanoff, John Wronosky, Donna O'Connell, Alvin Leung, Karen Jefferson, William Ballard, Layton Hale, Kenneth Blaedel, John Taylor, James Folta, Eberhard Spiller, Regina Soufli, Gary Sommargren, Donald Sweeney, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Jeffrey Bokor, David Attwood, Uwe Mickan, Ralph Hanzen, Eric Panning, Pei-yang Yan, John Bjorkholm, Charles Gwyn

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450953

KEYWORDS: Extreme ultraviolet, Reticles, Projection systems, Semiconducting wafers, Lithography, Monochromatic aberrations, Extreme ultraviolet lithography, Plasma, Sensors, Mirrors

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Proceedings Article | 20 December 2001 Paper

Improved reflectance and stability of Mo/Si multilayers

Sasa Bajt, Jennifer Alameda, Troy Barbee, W. Miles Clift, James Folta, Benjamin Kaufmann, Eberhard Spiller

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450946

KEYWORDS: Multilayers, Reflectivity, Silicon, Boron, Ruthenium, Molybdenum, Interfaces, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide

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Proceedings Article | 20 August 2001 Paper

Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution

Regina Soufli, Eberhard Spiller, Mark Schmidt, Courtney Davidson, R. Fred Grabner, Eric Gullikson, Benjamin Kaufmann, Stanley Mrowka, Sherry Baker, Henry Chapman, Russell Hudyma, John Taylor, Christopher Walton, Claude Montcalm, James Folta

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436695

KEYWORDS: Multilayers, Mirrors, Reflectivity, Optical coatings, Extreme ultraviolet lithography, Scattering, Extreme ultraviolet, Light scattering, Imaging systems, Cameras

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Proceedings Article | 20 August 2001 Paper

System integration and performance of the EUV engineering test stand

Daniel Tichenor, Avijit Ray-Chaudhuri, William Replogle, Richard Stulen, Glenn Kubiak, Paul Rockett, Leonard Klebanoff, Karen Jefferson, Alvin Leung, John Wronosky, Layton Hale, Henry Chapman, John Taylor, James Folta, Claude Montcalm, Regina Soufli, Eberhard Spiller, Kenneth Blaedel, Gary Sommargren, Donald Sweeney, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Jeffrey Bokor, Phillip Batson, David Attwood, Keith Jackson, Scott Hector, Charles Gwyn, Pei-yang Yan

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436665

KEYWORDS: Extreme ultraviolet, Semiconducting wafers, Reticles, Projection systems, Sensors, Xenon, Mirrors, Optical alignment, Fiber optic illuminators, Multilayers

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Proceedings Article | 21 July 2000 Paper

High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography

Marco Wedowski, James Underwood, Eric Gullikson, Sasa Bajt, James Folta, Patrick Kearney, Claude Montcalm, Eberhard Spiller

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390107

KEYWORDS: Multilayers, Reflectivity, Optical coatings, Reflectometry, Mirrors, Extreme ultraviolet lithography, Calibration, Sensors, Projection systems, Extreme ultraviolet

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Proceedings Article | 23 November 1999 Paper

Multilayer coated optics for an alpha-class extreme ultraviolet lithography system

Claude Montcalm, R. Fred Grabner, Russell Hudyma, Mark Schmidt, Eberhard Spiller, Christopher Walton, Marco Wedowski, James Folta

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371119

KEYWORDS: Reflectivity, Multilayers, Coating, Extreme ultraviolet, Extreme ultraviolet lithography, Projection systems, Lithography, Optical components, Mirrors, EUV optics

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Proceedings Article | 23 November 1999 Paper

Smoothing of mirror substrates by thin-film deposition

Eberhard Spiller, Sherry Baker, Enrique Parra, Charles Tarrio

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371112

KEYWORDS: Mirrors, Multilayers, Thin films, Silicon, Spatial frequencies, Atomic force microscopy, Extreme ultraviolet, Scattering, Thin film deposition, EUV optics

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Proceedings Article | 25 June 1999 Paper

Advances in multilayer reflective coatings for extreme ultraviolet lithography

James Folta, Sasa Bajt, Troy Barbee, R. Fred Grabner, Paul Mirkarimi, Tai Nguyen, Mark Schmidt, Eberhard Spiller, Christopher Walton, Marco Wedowski, Claude Montcalm

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351156

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet lithography, Optical coatings, Extreme ultraviolet, Mirrors, EUV optics, Lithography, Projection systems, Silicon

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Proceedings Article | 25 June 1999 Paper

Multilayer coating of 10X projection optics for extreme ultraviolet lithography

Claude Montcalm, Eberhard Spiller, Marco Wedowski, Eric Gullikson, James Folta

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351157

KEYWORDS: Reflectivity, Mirrors, Multilayers, Optical coatings, Projection systems, Extreme ultraviolet, Cameras, Extreme ultraviolet lithography, Tolerancing, Adaptive optics

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Proceedings Article | 25 June 1999 Paper

Sub-100-nm lithographic imaging with an EUV 10X microstepper

John Goldsmith, Kurt Berger, Dan Bozman, Gregory Cardinale, Daniel Folk, Craig Henderson, Donna O'Connell, Avijit Ray-Chaudhuri, Kenneth Stewart, Daniel Tichenor, Henry Chapman, Richard Gaughan, Russell Hudyma, Claude Montcalm, Eberhard Spiller, John Taylor, Jeffrey Williams, Kenneth Goldberg, Eric Gullikson, Patrick Naulleau, Jonathan Cobb

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351097

KEYWORDS: Cameras, Extreme ultraviolet, Imaging systems, Lithography, Extreme ultraviolet lithography, Projection systems, Photoresist developing, Photomasks, Wavefronts, Photoresist materials

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Proceedings Article | 25 June 1999 Paper

EUV scattering and flare of 10X projection cameras

Eric Gullikson, Sherry Baker, John Bjorkholm, Jeffrey Bokor, Kenneth Goldberg, John Goldsmith, Claude Montcalm, Patrick Naulleau, Eberhard Spiller, Daniel Stearns, John Taylor, James Underwood

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351162

KEYWORDS: Scattering, Cameras, Mirrors, Extreme ultraviolet, Spatial frequencies, Point spread functions, Light scattering, Multilayers, Laser scattering, Coating

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Proceedings Article | 5 June 1998 Paper

Multilayer coating and tests of a 10x extreme-ultraviolet lithographic camera

Eberhard Spiller, Frank Weber, Claude Montcalm, Sherry Baker, Eric Gullikson, James Underwood

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309617

KEYWORDS: Mirrors, Coating, Reflectivity, Cameras, Multilayers, Scattering, Extreme ultraviolet, Light scattering, Sputter deposition, Lithium

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Proceedings Article | 5 June 1998 Paper

Multilayer reflective coatings for extreme-ultraviolet lithography

Claude Montcalm, Sasa Bajt, Paul Mirkarimi, Eberhard Spiller, Frank Weber, James Folta

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309600

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Optical coatings, EUV optics, Silicon, Interfaces, Molybdenum

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Proceedings Article | 15 October 1997 Paper

Objective Crystal Spectrometer (OXS) on the Spectrum-X-y satellite: crystal calibrations

Salim Abdali, Finn Christensen, Herbert Schnopper, Leif Gerward, Hans-Joachim Wiebicke, Ingolf Halm, Eric Louis, Harm-Jan Voorma, Eberhard Spiller, Charles Tarrio

Proceedings Volume 3114, (1997) https://doi.org/10.1117/12.283779

KEYWORDS: Crystals, Reflectivity, Mirrors, Spectroscopy, Multilayers, Silicon, Laser induced fluorescence, X-rays, Calibration, Laser crystals

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Proceedings Article | 20 June 1995 Paper

Hard and soft x-ray study of the correlation between substrate quality and multilayer performance for Co/C coating produced by electron beam evaporation using ion polishing

Salim Abdali, Finn Christensen, Eberhard Spiller, Eric Louis, Harm-Jan Voorma

Proceedings Volume 2515, (1995) https://doi.org/10.1117/12.212620

KEYWORDS: Multilayers, X-rays, Reflectivity, Polishing, Glasses, Coating, Ions, Hard x-rays, Scattering, Silicon

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Proceedings Article | 20 June 1995 Paper

Multilayer x-ray mirrors for the objective crystal spectrometer on the Spectrum Roentgen Gamma satellite

Eric Louis, Eberhard Spiller, Salim Abdali, Finn Christensen, Harm-Jan Voorma, Norbert Koster, Peter Frederiksen, Charles Tarrio, Eric Gullikson, Fred Bijkerk

Proceedings Volume 2515, (1995) https://doi.org/10.1117/12.212588

KEYWORDS: Crystals, Reflectivity, Multilayers, Polishing, X-rays, Mirrors, Spectroscopy, Krypton, Ions, Interfaces

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Proceedings Article | 20 June 1995 Paper

Normal incidence optics for solar coronal imaging

Eberhard Spiller, Janusz Wilczynski, Leon Golub, George Nystrom, Eric Gullikson, Charles Tarrio

Proceedings Volume 2515, (1995) https://doi.org/10.1117/12.212583

KEYWORDS: Mirrors, Reflectivity, Polishing, X-rays, Telescopes, X-ray telescopes, Multilayers, Surface finishing, Coronagraphy, Ions

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SPIE Press Book | 10 August 1994

Soft X-Ray Optics

Eberhard Spiller

KEYWORDS: Reflectivity, Multilayers, X-rays, Coating, Scattering, Absorption, Reflection, X-ray optics, Zone plates, Mirrors

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Proceedings Article | 1 February 1994 Paper

Results from the recent flights of the IBM/SAO x-ray telescopes

Eberhard Spiller, Troy Barbee, Leon Golub, Kenneth Kalata, George Nystrom, A. Viola

Proceedings Volume 2011, (1994) https://doi.org/10.1117/12.167236

KEYWORDS: Mirrors, Telescopes, Multilayers, X-rays, Magnetism, Sun, Coating, Coronagraphy, X-ray telescopes, Reflectivity

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Proceedings Article | 1 February 1994 Paper

Studies toward the optimization of ion polishing for multilayer x-ray mirrors

Eberhard Spiller, Ki-Byoung Youn

Proceedings Volume 2011, (1994) https://doi.org/10.1117/12.167205

KEYWORDS: Polishing, Reflectivity, Ions, Multilayers, Mirrors, Metals, Nickel, Ruthenium, Carbon, Ion beams

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Proceedings Article | 1 January 1992 Paper

Normal incidence soft x-ray lambda=63.5 A telescope of 1991

Eberhard Spiller, Janusz Wilczynski, Leon Golub, George Nystrom

Proceedings Volume 1546, (1992) https://doi.org/10.1117/12.51262

KEYWORDS: Mirrors, X-rays, Polishing, Telescopes, X-ray telescopes, Multilayers, Visible radiation, Reflectivity, Monochromatic aberrations, Carbon

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Proceedings Article | 1 January 1992 Paper

Soft x-ray optics 1971-1981: a personal history

Eberhard Spiller

Proceedings Volume 1546, (1992) https://doi.org/10.1117/12.51244

KEYWORDS: Multilayers, Mirrors, Coating, Reflectivity, X-ray optics, Absorption, X-rays, Grazing incidence, Holograms, X-ray telescopes

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SPIE Journal Paper | 1 August 1991

Normal incidence soft x-ray telescopes

Eberhard Spiller, R. McCorkle, Janusz Wilczynski, Leon Golub, George Nystrom, Peter Takacs, Charles Welch

OE, Vol. 30, Issue 08, (August 1991) https://doi.org/10.1117/12.10.1117/12.55915

KEYWORDS: Mirrors, Telescopes, Scattering, X-ray telescopes, Reflectivity, Spatial frequencies, Rockets, X-rays, Light scattering, Coating

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Proceedings Article | 1 February 1991 Paper

Imaging performance and tests of soft x-ray telescopes

Eberhard Spiller, R. McCorkle, Janusz Wilczynski, Leon Golub, George Nystrom, Peter Takacs, Charles Welch

Proceedings Volume 1343, (1991) https://doi.org/10.1117/12.23186

KEYWORDS: Mirrors, Telescopes, X-ray telescopes, Scattering, X-rays, Spatial frequencies, Rockets, X-ray optics, Microscopy, Multilayers

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Proceedings Article | 1 July 1990 Paper

Multilayer x-ray optics

Eberhard Spiller

Proceedings Volume 1319, (1990) https://doi.org/10.1117/12.34931

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SPIE Journal Paper | 1 June 1990

Enhancement of the reflectivity of multilayer x-ray mirrors by ion polishing

Eberhard Spiller

OE, Vol. 29, Issue 06, (June 1990) https://doi.org/10.1117/12.10.1117/12.55642

KEYWORDS: Mirrors, Reflectivity, X-rays, Ions, Polishing, Reflector telescopes, Telescopes

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SPIE Journal Paper | 1 June 1990

Filters for soft x-ray solar telescopes

Eberhard Spiller, Kurt Grebe, Leon Golub

OE, Vol. 29, Issue 06, (June 1990) https://doi.org/10.1117/12.10.1117/12.55633

KEYWORDS: X-ray telescopes, X-rays, Solar telescopes, Optical filters, Visible radiation, Infrared telescopes, Infrared radiation, Optical properties, Optical fabrication, Testing and analysis

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