Mr. David J. Elliott Profile

David J. Elliott

President/CEO at UVTech Systems Inc

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Author

Publications (7)

Proceedings Article | 11 March 2010 Paper

Analysis of photoresist edge bead removal using laser light and gas

V. Chaplick, E. Degenkolb, D. Elliott, K. Harte, R. Millman, M. Tardif

Proceedings Volume 7640, 76403J (2010) https://doi.org/10.1117/12.853444

KEYWORDS: Semiconducting wafers, Gas lasers, Photoresist materials, Particles, Silicon, Semiconductor lasers, Coating, Manufacturing, Yield improvement, Pulsed laser operation

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Proceedings Article | 31 March 1997 Paper

UV and gas interactions in an enclosed 193-nm excimer laser beamline

David Elliot, Jonathan Camp, Warren Harlow, Victor Dosoretz, Daniel Behr, Glen Callahan, Scott Flint

Proceedings Volume 2992, (1997) https://doi.org/10.1117/12.270099

KEYWORDS: Ozone, Mirrors, Ultraviolet radiation, Excimer lasers, Coating, Absorption, Laser optics, Pulsed laser operation, Sensors, Semiconducting wafers

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Proceedings Article | 17 May 1994 Paper

Small-field projection imaging system for deep-UV development

Richard Hollman, David Elliott

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175479

KEYWORDS: Sensors, Imaging systems, Semiconducting wafers, Deep ultraviolet, Calibration, Photoresist materials, Reticles, Control systems, Photoresist developing, Combined lens-mirror systems

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Proceedings Article | 15 September 1993 Paper

Evaluation of a 193-nm resist and imaging system

Donald Johnson, David Elliott

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154776

KEYWORDS: Imaging systems, Semiconducting wafers, Excimer lasers, Image resolution, Etching, Combined lens-mirror systems, 193nm lithography, Optical lithography, Deep ultraviolet, Lithography

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Proceedings Article | 19 April 1993 Paper

Submicron deep-UV imaging with a catadioptric step-and-repeat exposure system

David Elliott

Proceedings Volume 1835, (1993) https://doi.org/10.1117/12.143051

KEYWORDS: Imaging systems, Wafer-level optics, Semiconducting wafers, Reticles, Excimer lasers, Image resolution, Deep ultraviolet, Lithography, Control systems, Optical alignment

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Proceedings Article | 1 June 1992 Paper

Design and performance of a production-worthy excimer-laser-based stepper

, Christopher Sparkes, Peter DiSessa, David Elliott

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130362

KEYWORDS: Control systems, Semiconducting wafers, Laser stabilization, Overlay metrology, Reliability, Excimer lasers, Optical lithography, Lithography, Optics manufacturing, Deep ultraviolet

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Proceedings Article | 1 March 1991 Paper

Excimer lasers for deep-UV lithography

David Elliott, Uday Sengupta

Proceedings Volume 1377, (1991) https://doi.org/10.1117/12.25017

KEYWORDS: Excimer lasers, Semiconducting wafers, Materials processing, Beam delivery, Laser processing, Deep ultraviolet, Lithography, Optical lithography, Laser stabilization, Safety

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Showing 5 of 7 publications

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