Mr. Daniel P. Ceperley Profile

Daniel P. Ceperley

Founder & CEO at LeoLabs Inc

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Author

Publications (9)

Proceedings Article | 30 October 2007 Paper

Characterization and monitoring of photomask edge effects

Marshal Miller, Andrew Neureuther, Daniel Ceperley, Juliet Rubinstein

Proceedings Volume 6730, 67301U (2007) https://doi.org/10.1117/12.746805

KEYWORDS: Photomasks, Glasses, Phase shifting, Polarization, Finite-difference time-domain method, Phase shifts, Electromagnetic simulation, Etching, Dielectrics, Diffraction

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Proceedings Article | 28 March 2007 Open Access

Collaborative platform, tool-kit, and physical models for DfM

Andy Neureuther, Wojtek Poppe, Juliet Holwill, Eric Chin, Lynn Wang, Jae-Seok Yang, Marshal Miller, Dan Ceperley, Chris Clifford, Koji Kikuchi, Jihong Choi, Dave Dornfeld, Paul Friedberg, Costas Spanos, John Hoang, Jane Chang, Jerry Hsu, David Graves, Alan Wu, Mike Lieberman

Proceedings Volume 6521, 652104 (2007) https://doi.org/10.1117/12.721199

KEYWORDS: Design for manufacturing, Photomasks, Device simulation, Computer aided design, Process modeling, Etching, Monochromatic aberrations, Manufacturing, Lithography, Chemical mechanical planarization

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Proceedings Article | 20 October 2006 Paper

Revisiting mask contact hole measurements

Masaru Higuchi, Emily Gallagher, Daniel Ceperley, Timothy Brunner, Reg Bowley, Anne McGuire

Proceedings Volume 6349, 634947 (2006) https://doi.org/10.1117/12.686957

KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Line edge roughness, Critical dimension metrology, Error analysis, Time metrology, Scanning electron microscopy, Microelectronics, Lithography

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Proceedings Article | 7 July 2006 Paper

Fabrication and characteristics of free-standing shaped pupil masks for TPF-coronagraph

Kunjithapatham Balasubramanian, Pierre Echternach, Matthew Dickie, Richard Muller, Victor White, Daniel Hoppe, Stuart Shaklan, Ruslan Belikov, N. Jeremy Kasdin, Robert Vanderbei, Daniel Ceperley, Andrew Neureuther

Proceedings Volume 6265, 62653N (2006) https://doi.org/10.1117/12.673251

KEYWORDS: Photomasks, Silicon, Etching, Coronagraphy, Deep reactive ion etching, Manufacturing, Stars, Semiconducting wafers, Planets, Diffraction

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Proceedings Article | 23 June 2006 Paper

Stray-light sources from pupil mask edges and mitigation techniques for the TPF Coronagraph

Daniel Ceperley, Andrew Neureuther, Marshall Miller, Michael Lieber, Jeremy Kasdin

Proceedings Volume 6271, 62711F (2006) https://doi.org/10.1117/12.684699

KEYWORDS: 3D modeling, Photomasks, Silicon, Diffraction, Manufacturing, Systems modeling, Polarization, Near field, Coronagraphy, Finite-difference time-domain method

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Stray-light sources from pupil plane masks that may limit Terrestrial Planet Finder Coronagraph (TPF-C) performance are characterized^1,2 and mitigation strategies are discussed to provide a guide for future development. Rigorous vector simulation with the Finite-Difference Time-Domain (FDTD) method is used to characterize waveguiding effects in narrow openings, sidewall interactions, manufacturing tool-marks, manufacturing roughness, mask tilt, and cross-wavelength performance of thick Silicon mask structures. These effects cause stray-light that is not accounted for in scalar thin-mask diffraction theory, the most important of which are sidewall interactions, waveguiding effects in narrow openings, and tilt. These results have been used to improve the scalar thin-mask theory used to simulate the TPF-C with the Integrated Telescope Model.³ Of particular interest are simulations of 100m thick vertical sidewall openings that model features typically found on Ripple masks⁴ fabricated by Reactive Ion Etching (RIE) processes.⁵ This paper contributes fundamental data for systematically modeling these effects in end-to-end system simulation. Leakage straight through the mask material varies greatly with wavelength, especially in Silicon (an attractive mask material due to the precision manufacturing techniques developed by the IC industry). Coating Silicon with 200nm of Chrome effectively mitigates the leakage without causing additional scattering. Thick-mask diffraction differs from the predictions of scalar thin-mask theory because diffraction spreading is confined by the mask's sidewalls. This confinement can make a mask opening look electro-magnetically larger or smaller than designed, by up to 3λ per vertical sidewall on a 50μm thick mask yet this can be reduced an order of magnitude by undercutting the sidewalls 20°. These confinement effects are sensitive to mask tilt (if light reaches the sidewalls) which can lead to an imbalance in stray-light sources and an extra wavelength of effective opening change on the illuminated sidewall.

Proceedings Article | 14 September 2005 Paper

Evaluating the end-to-end performance of TPF-C with vector propagation models: Part I. Pupil mask effects

Mike Lieber, Andrew Neureuther, Dan Ceperley, Jeremy Kasdin, Dan Hoppe, Allan Eisenman

Proceedings Volume 5905, 59050K (2005) https://doi.org/10.1117/12.615589

KEYWORDS: Planets, Performance modeling, Wave propagation, Wavefronts, Light wave propagation, Information technology, Coronagraphy, Stars, Control systems, Finite-difference time-domain method

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Proceedings Article | 14 September 2005 Paper

Characterizing edge-generated stray light sources for TPF Coronagraph pupil masks

Daniel Ceperley, Andrew Neureuther, Michael Lieber, Jeremy Kasdin

Proceedings Volume 5905, 59050J (2005) https://doi.org/10.1117/12.617221

KEYWORDS: Surface plasmons, Polarization, Telescopes, Integrated modeling, Coronagraphy, Surface plasmon polaritons, Finite-difference time-domain method, Refractive index, Planets, Stray light

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Proceedings Article | 15 October 2004 Paper

Vector scattering analysis of TPF coronagraph pupil masks

Daniel Ceperley, Andrew Neureuther, Michael Lieber, N. Jeremy Kasdin, Ta-Ming Shih

Proceedings Volume 5526, (2004) https://doi.org/10.1117/12.562265

KEYWORDS: Photomasks, Polarization, Finite-difference time-domain method, Coronagraphy, Air contamination, Metals, Planets, Scattering, Chromium, Systems modeling

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Proceedings Article | 12 October 2004 Paper

Vector wavefront propagation modeling for the TPF coronagraph

Michael Lieber, Andrew Neureuther, Dan Ceperley, N. Jeremy Kasdin, Nikolay Ter-Gabrielyan

Proceedings Volume 5487, (2004) https://doi.org/10.1117/12.550742

KEYWORDS: Wavefronts, Wave propagation, Finite-difference time-domain method, Coronagraphy, Planets, Light wave propagation, Polarization, Performance modeling, Diffraction, Photomasks

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