Mr. Damon M. Cole Profile

Damon M. Cole

Director of Technical Marketing

SPIE Involvement:

Author

Proceedings Article | 8 November 2012 Paper

Future mask writers requirements for the sub-10nm node era

Mahesh Chandramouli, Frank Abboud, Nathan Wilcox, Andrew Sowers, Damon Cole

Proceedings Volume 8522, 85221K (2012) https://doi.org/10.1117/12.977172

KEYWORDS: Photomasks, Vestigial sideband modulation, Electron beam lithography, Lithography, Raster graphics, Photomask technology, Beam shaping, Electrons, Signal to noise ratio, Optical proximity correction

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Proceedings Article | 20 October 2006 Paper

Variable shaped beam writing throughput at the 45nm node and beyond

A. Sowers, M. Shumway, M. Kamna, N. Wilcox, M. Vernon, D. Cole, M. Chandramouli

Proceedings Volume 6349, 63490V (2006) https://doi.org/10.1117/12.686566

KEYWORDS: Vestigial sideband modulation, Beam shaping, Photomasks, Manufacturing, Data modeling, Optical proximity correction, Optical lithography, Model-based design, Manufacturing equipment

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Proceedings Article | 5 November 2005 Paper

Production performance of a Sigma7300 DUV mask writer

Bob Olshausen, Mahesh Chandramouli, Dustin Wall, Bruce Auches, Damon Cole

Proceedings Volume 5992, 59920V (2005) https://doi.org/10.1117/12.633167

KEYWORDS: Spatial light modulators, Binary data, Deep ultraviolet, Neodymium, Electron beam lithography, Calibration, Data conversion, Overlay metrology, Critical dimension metrology, Photoresist processing

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Proceedings Article | 28 June 2005 Paper

Second level exposure for phase shift mask applications using an SLM-based DUV mask writer

Mahesh Chandramouli, Bob Olshausen, Yulia Korobko, Sven Henrichs, Ping Qu, Jian Ma, Bruce Auches, Damon Cole, Thomas Ostrom, Angela Beyerl, Robert Eklund, Raoul Zerne, Peter Goransson, Magnus Persson, Tom Newman

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617359

KEYWORDS: Neodymium, Photomasks, Spatial light modulators, Deep ultraviolet, Electron beam lithography, Optical alignment, Quartz, Optical lithography, Chromium, Critical dimension metrology

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Proceedings Article | 20 August 2004 Paper

Comparative study of two negative CAR resists: EN-024M and NEB 31

Ki-Ho Baik, Robert Dean, Homer Lem, Stephen Osborne, Mark Mueller, Damon Cole

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557718

KEYWORDS: Coating, Line edge roughness, Scanning electron microscopy, Etching, Photomicroscopy, Lithography, Photomasks, Critical dimension metrology, Optical proximity correction, Raster graphics

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Proceedings Article | 1 August 2002 Paper

Raster scan patterning solution for 100- and 70-nm OPC masks

Frank Abboud, Ki-Ho Baik, Varoujan Chakarian, Damon Cole, Robert Dean, Mark Gesley, Herb Gillman, William Moore, Mark Mueller, Robert Naber, Thomas Newman, Romin Puri, Frederick Raymond, Mario Rougieri

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476923

KEYWORDS: Photomasks, Raster graphics, Optical proximity correction, Etching, Control systems, Point spread functions, Optical lithography, Electron beam lithography, Lithography, Edge roughness

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Proceedings Article | 11 March 2002 Paper

100-nm OPC mask patterning using raster-scan 50-kV pattern generation technology

Frank Abboud, Ki-Ho Baik, Varoujan Chakarian, Damon Cole, Jay Daniel, Robert Dean, Mark Gesley, Robert Naber, Thomas Newman, Frederick Raymond, David Trost, Mark Wiltse, William DeVore

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.491928

KEYWORDS: Photomasks, Optical proximity correction, Raster graphics, Optical lithography, Electron beam lithography, Edge roughness, Lithography, Model-based design, Point spread functions, Photoresist processing

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Proceedings Article | 9 April 2001 Paper

130-nm node mask development

Jan Chabala, Suzanne Weaver, David Alexander, Maiying Lu, Nam-Wook Kim, Damon Cole

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425102

KEYWORDS: Critical dimension metrology, Photomasks, Lithography, Photomicroscopy, Dry etching, Etching, Statistical analysis, Edge roughness, Scanning electron microscopy, Photoresist processing

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Proceedings Article | 21 July 2000 Paper

Evaluation of a high-dose extended multipass gray writing system for 130-nm pattern generation

Jan Chabala, Suzanne Weaver, David Alexander, Henry Pearce-Percy, Maiying Lu, Damon Cole, Frank Abboud

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390067

KEYWORDS: Photomasks, Printing, Critical dimension metrology, Composites, Optical proximity correction, Lithography, Atomic force microscopy, Line edge roughness, Etching, Control systems

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Proceedings Article | 3 February 2000 Paper

Lithography and CD performance of advanced MEBES mask pattern generators

Jan Chabala, Damon Cole, Henry Pearce-Percy, Wayne Phillips, Maiying Lu, Suzanne Weaver, David Alexander, T. Coleman, Charles Sauer, Frank Abboud

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377110

KEYWORDS: Photomasks, Lithography, Critical dimension metrology, Printing, Error analysis, Photoresist processing, Metrology, Dry etching, Etching, Charged particle optics

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Proceedings Article | 30 December 1999 Paper

Extension of graybeam writing for the 130-nm technology node

Jan Chabala, Frank Abboud, Charles Sauer, Suzanne Weaver, Maiying Lu, Henry Pearce-Percy, Ulrich Hofmann, Matthew Vernon, Dinh Ton, Damon Cole, Robert Naber

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373345

KEYWORDS: Lithography, Photomasks, Printing, Critical dimension metrology, Scattering, Metrology, Dry etching, Etching, Charged particle optics, Error analysis

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Proceedings Article | 30 December 1999 Paper

Reduction of beam-induced pattern placement errors in MEBES systems

David Alexander, Lee Veneklasen, Suzanne Weaver, Jeffrey Varner, Damon Cole

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373348

KEYWORDS: Error analysis, Chromium, Photoresist processing, Dielectrics, Dielectric breakdown, Electron beams, Backscatter, Data modeling, Chlorine, Process control

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Proceedings Article | 25 June 1999 Paper

Lithographic analysis of multipass gray writing strategy for electron-beam pattern generation

Jan Chabala, Frank Abboud, Robert Dean, Suzanne Weaver, Damon Cole, Charles Sauer, Frederick Raymond, Ulrich Hofmann

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351081

KEYWORDS: Printing, Lithography, Photomasks, Monte Carlo methods, Line edge roughness, Computer aided design, Scattering, Dry etching, Etching, Critical dimension metrology

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Proceedings Article | 18 December 1998 Paper

New MEBES pattern generator

Jan Chabala, Frank Abboud, Suzanne Weaver, Damon Cole

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332854

KEYWORDS: Critical dimension metrology, Metrology, Photomasks, Monochromatic aberrations, Etching, Dry etching, Composites, Printing, Photoresist processing, Reticles

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Proceedings Article | 12 February 1997 Paper

Advanced electron-beam pattern generation technology for 180-nm masks

Frank Abboud, Charles Sauer, William Wang, Matthew Vernon, Richard Prior, Henry Pearce-Percy, Damon Cole, Marian Mankos

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301178

KEYWORDS: Etching, Photomasks, Dry etching, Raster graphics, Monochromatic aberrations, Semiconducting wafers, Optical proximity correction, Lithography, Binary data, Reticles

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Showing 5 of 15 publications

Conference Committee Involvement (1)

Emerging Patterning Technologies 2017

27 February 2017 | San Jose, California, United States

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