Imec’s AttoLab is the first industrial laboratory capable of watching the ultrafast dynamics of photoresists following 13.5 nm, EUV exposure, and for emulating high-numerical-aperture (high-NA) exposure on 300-mm wafers using two-beam EUV interference. The two respective beamlines are powered by a laser-based high-harmonic generation EUV source. Its capabilities have recently been proven by imaging 20 nm pitch lines and spaces using Lloyd’s Mirror interference lithography. In parallel, time-averaged and time-resolved techniques for studying the ultrafast dynamics of photoresists after EUV exposure, coherent diffractive imaging to study resist interfaces, and more sophisticated interference lithography techniques for printing sub-22 nm pitches on full 300-mm wafers are being developed. Taking advantage of the bright and short EUV pulses now available at imec, we will be able to contribute to a smooth transition towards next generation high-NA lithography.
Recently, imec has installed and commissioned an industrial, ultrafast EUV materials characterization and lithography lab, imec’s AttoLab, with a primary aim to explore limits of photoresist performance and their associated ultrafast chemistries. Here, we demonstrate, for the first time, the use of a table-top, high-harmonic EUV system (KM Labs, XUUS4) to perform interference lithography of sub-22-nm pitch patterns in an Inpria MOx resist via a Lloyd’s mirror interference lithography (IL) tool. Analysis of SEM images enables us to identify potential sources of image blur, which we attribute to out-of-sync vibrations, flare, spectral purity, and laser stability. Nevertheless, these results confirm the ability of table-top, high-harmonic EUV sources to print lithographic patterns below a 22-nm pitch. In future work, we plan to investigate sub-20-nm patterning in different resist formulations, as well as expand the lithographic capabilities in AttoLab to perform IL on full 300-mm wafers.
We demonstrate lensless diffractive microscopy using a tabletop source of extreme ultraviolet (EUV) light from high harmonic generation at 29 nm and 13.5 nm. High harmonic generation has been shown to produce fully spatially coherent EUV light when the conversion process is well phase-matched in a hollow-core waveguide. We use this spatial coherence for two related diffractive imaging techniques which circumvent the need for lossy imaging optics in the EUV region of the spectrum. Holography with a reference beam gives sub-100 nm resolution in short exposure times with fast image retrieval. Application of the Guided Hybrid Input-Output phase retrieval algorithm refines the image resolution to 53 nm with 29 nm light. Initial images using the technologically important 13.5 nm wavelength give 92-nm resolution in a 10-minute exposure. Straightforward extensions of this work should also allow near-wavelength resolution with the 13.5 nm source. Diffractive imaging techniques provide eased alignment and focusing requirements
as compared with zone plate or multilayer mirror imaging systems. The short-pulsed nature of the extreme ultraviolet source will allow pump-probe imaging of materials dynamics with time resolutions down to the pulse duration of the EUV.
High harmonic generation (HHG) is a useful source of coherent light in the extreme ultraviolet (EUV) region of the spectrum. However, both the conversion efficiency and the highest achievable photon energy have in the past been limited in the past by the inability to phase-match the frequency conversion process. In this paper, we summarize recent results on the development of new techniques for phase-matching the high-harmonic conversion process. We also summarize finding from three series of experiments that make use of the coherent EUV light generated using HHG: 1) probing of acoustic dynamics in materials; 2) monitoring of chemical dynamics at surfaces using photoelectron spectroscopy; and 3) time-resolved plasma imaging.
We present a simple setup for obtaining high resolution, sub-micron images using high harmonic generation (HHG) in a hollow-core waveguide as a light source. We demonstrate imaging with illumination at a wavelength of 30 nm using an all-reflective, double-multilayer mirror setup and a CCD camera as a recording device. For the magnifications of up to 50x used here, the all-reflective setup has advantages over zone plate microscopes because of the much larger working distances that allow for imaging of plasmas. This setup has also a throughput that is higher by at least a factor of three compared to zone-plate microscopes, and presents the additional advantage of preserving the temporal pulse width of the harmonics because diffractive optics are not used. This work demonstrates the feasibility of high-spatial-resolution, time-resolved, EUV imaging of plasmas and other objects using a tabletop compact light source.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.