Clara F. L. Stolzenberg
at Technische Univ Ilmenau
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 4 March 2022 Presentation + Paper
Proceedings Volume 11989, 119890U (2022) https://doi.org/10.1117/12.2609417
KEYWORDS: Lithography, Femtosecond phenomena, Photons, Beam expanders, Photosensitive materials, Direct write lithography, Multiphoton lithography, Absorption

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