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Christopher Rowan
Managing Partner at Arscientia
SPIE Involvement:
Author | Prism Awards Judge | Startup Challenge Judge | Startup Challenge Judge
Publications (1)
Proceedings Article | 5 July 2000 Paper
Modeling the effects of excimer laser bandwidths on lithographic performance
Armen Kroyan, Joseph Bendik, Olivier Semprez, Nigel Farrar, Christopher Rowan, Chris Mack
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389057
KEYWORDS: Chromatic aberrations, Lithography, Excimer lasers, Light sources, Optical simulations, Performance modeling, Deep ultraviolet, Chlorine, Critical dimension metrology, Optical lithography
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