Dr. Chengqing Wang Profile

Dr. Chengqing Wang

System Engineer at Applied Materials

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Publications (9)

SPIE Journal Paper | 3 April 2023 Open Access

Review of the key milestones in the development of critical dimension small angle x-ray scattering at National Institute of Standards and Technology

Wen-li Wu, R. Joseph Kline, Ronald L. Jones, Hae-Jeong Lee, Eric K. Lin, Daniel F. Sunday, Chengqing Wang, Tengjiao Hu, Christopher L. Soles

JM3, Vol. 22, Issue 03, 031206, (April 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.3.031206

KEYWORDS: X-rays, Scattering, Metrology, Semiconductors, Critical dimension metrology, Lithography, Industry, Standards development, 3D metrology, Nanostructures

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SPIE Journal Paper | 12 August 2013

Three-dimensional x-ray metrology for block copolymer lithography line-space patterns

Daniel Sunday, Matthew Hammond, Chengqing Wang, Wen-li Wu, R. Joseph Kline, Gila Stein

JM3, Vol. 12, Issue 03, 031103, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.031103

KEYWORDS: Scattering, X-rays, Picosecond phenomena, Lithography, Polymethylmethacrylate, Metrology, 3D metrology, X-ray lithography, Absorption, Directed self assembly

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Proceedings Article | 10 April 2013 Paper

Critical dimension small angle X-ray scattering measurements of FinFET and 3D memory structures

Charles Settens, Benjamin Bunday, Brad Thiel, R. Joseph Kline, Daniel Sunday, Chengqing Wang, Wen-li Wu, Richard Matyi

Proceedings Volume 8681, 86810L (2013) https://doi.org/10.1117/12.2012019

KEYWORDS: Scattering, 3D metrology, Critical dimension metrology, X-rays, Etching, Silicon, Metrology, Oxides, Scatter measurement

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Proceedings Article | 10 April 2013 Paper

Intercomparison between optical and x-ray scatterometry measurements of FinFET structures

P. Lemaillet, T. Germer, R. Joseph Kline, Daniel Sunday, Chengqing Wang, Wen-li Wu

Proceedings Volume 8681, 86810Q (2013) https://doi.org/10.1117/12.2011144

KEYWORDS: X-rays, X-ray optics, Scatterometry, Metrology, Silica, Scattering, Interfaces, Scatter measurement, Silicon

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Proceedings Article | 24 March 2009 Paper

Nonplanar high-k dielectric thickness measurements using CD-SAXS

Chengqing Wang, Kwang-Woo Choi, Yi-Ching Chen, Jimmy Price, Derek Ho, Ronald Jones, Christopher Soles, Erik Lin, Wen-Li Wu, Benjamin Bunday

Proceedings Volume 7272, 72722M (2009) https://doi.org/10.1117/12.813757

KEYWORDS: Dielectrics, Scanning electron microscopy, Scattering, X-rays, Data modeling, Sensors, Transistors, Critical dimension metrology, Laser scattering, Silicon

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Proceedings Article | 24 March 2008 Paper

Linewidth roughness and cross-sectional measurements of sub-50 nm structures with CD-SAXS and CD-SEM

Chengqing Wang, Kwang-Woo Choi, Ronald Jones, Christopher Soles, Eric Lin, Wen-li Wu, James Clarke, John Villarrubia, Benjamin Bunday

Proceedings Volume 6922, 69221Z (2008) https://doi.org/10.1117/12.773558

KEYWORDS: Line width roughness, Line edge roughness, Diffraction, X-rays, Critical dimension metrology, Scattering, Sensors, Laser scattering, Extreme ultraviolet lithography, Extreme ultraviolet

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Proceedings Article | 24 March 2008 Paper

CD-SAXS measurements using laboratory-based and synchrotron-based instruments

Chengqing Wang, Kwang-Woo Choi, Wei-En Fu, Derek Ho, Ronald Jones, Christopher Soles, Eric Lin, Wen-Li Wu, James Clarke, Benjamin Bunday

Proceedings Volume 6922, 69222E (2008) https://doi.org/10.1117/12.773774

KEYWORDS: Diffraction, Line width roughness, Line edge roughness, Synchrotrons, X-rays, Satellites, Metrology, X-ray diffraction, Collimation, Scattering

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Proceedings Article | 5 April 2007 Paper

Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results

Chengqing Wang, Ronald Jones, Eric Lin, Wen-li Wu, John Villarrubia, Kwang-Woo Choi, James Clarke, Bryan Rice, Michael Leeson, Jeanette Roberts, Robert Bristol, Benjamin Bunday

Proceedings Volume 6518, 65181O (2007) https://doi.org/10.1117/12.725380

KEYWORDS: Line width roughness, Line edge roughness, Diffraction, Critical dimension metrology, Photoresist materials, X-rays, Scattering, Satellites, Extreme ultraviolet lithography, Sensors

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Proceedings Article | 24 March 2006 Paper

Characterization of line edge roughness using CD-SAXS

Ronald Jones, Wen-li Wu, Cheng-qing Wang, Eric Lin, Kwang-Woo Choi, Bryan Rice, George Thompson, Steven Weigand, Denis Keane

Proceedings Volume 6152, 61520N (2006) https://doi.org/10.1117/12.656829

KEYWORDS: Line edge roughness, Diffraction, Line width roughness, Satellites, Data modeling, X-rays, Scattering, Laser scattering, Scanning electron microscopy, Sensors

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Showing 5 of 9 publications

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