Dr. Aurélie Le Pennec Profile

Dr. Aurélie Le Pennec

at CEA-Grenoble

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Author

Publications (4)

Proceedings Article | 22 February 2021 Presentation + Paper

Roughness measurement of 2D curvilinear patterns: challenges and advanced methodology

Jonathan Pradelles, Loïc Perraud, Aurélien Fay, Elie Sezestre, Jean-Baptiste Henry, Jessy Bustos, Estelle Guyez, Sébastien Berard-Bergery, Aurélie Le Pennec, Mohamed Abaidi, Jordan Belissard, Nivea Schuch, Matthieu Millequant, Thiago Figueiro, Patrick Schiavone

Proceedings Volume 11611, 1161110 (2021) https://doi.org/10.1117/12.2583843

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Proceedings Article | 3 April 2020 Paper

Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography

G. Rademaker, A. Le Pennec, T. Giammaria, K. Benotmane, H. Pham, C. Bouet, M. G. Gusmao Cacho, M. Argoud, M.-L. Pourteau, A. Paquet, A. Gharbi, C. Navarro, C. Nicolet, X. Chevalier, K. Sakavuyi, P. Nealey, R. Tiron

Proceedings Volume 11326, 113260Z (2020) https://doi.org/10.1117/12.2552003

KEYWORDS: Lithography, Metrology, Directed self assembly, Immersion lithography, Photomasks, Optical lithography, Etching, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 25 March 2020 Paper

Block copolymer line roughness measurement via PSD: application to fingerprint samples

Aurélie Le Pennec, Jérôme Rêche, Patrick Quéméré, Guido Rademaker, Romain Jarnias, Charlotte Bouet, Célia Nicolet, Christophe Navarro, Maxime Argoud, Raluca Tiron

Proceedings Volume 11326, 113261I (2020) https://doi.org/10.1117/12.2551854

KEYWORDS: Line width roughness, Ultraviolet radiation, Edge detection, Polymethylmethacrylate, Directed self assembly, Binary data, Polymerization, Statistical analysis, Software development

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Proceedings Article | 26 March 2019 Paper

Spacer patterning lithography as a new process to induce block copolymer alignment by chemo-epitaxy

A. Paquet, A. Le Pennec, A. Gharbi, T. Giammaria, G. Rademaker, M.-L. Pourteau, D. Mariolle, C. Navarro, C. Nicolet, X. Chevalier, K. Sakavuyi, L. Pain, P. Nealey, R. Tiron

Proceedings Volume 10958, 109580M (2019) https://doi.org/10.1117/12.2514960

KEYWORDS: Etching, Lithography, Optical lithography, Wet etching, HF etching, Critical dimension metrology, Silicon, System on a chip, Tin

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