Dr. Anagnostis Paraskevopoulos
Group Leader “Intra-machine communications” at Fraunhofer HHI
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 15 March 2023 Presentation + Paper
Proceedings Volume 12413, 124130W (2023) https://doi.org/10.1117/12.2652245
KEYWORDS: Satellites, Laser communication terminals, Optical amplifiers, Free space optics, Field programmable gate arrays, Single mode fibers, Scintillation, Transceivers, Dense wavelength division multiplexing, Antennas

Proceedings Article | 11 June 2021 Open Access Presentation + Paper
A. Le Kernec, L. Canuet, A. Maho, M. Sotom, D. Matter, L. Francou, J. Edmunds, M. Welch, E. Kehayas, N. Perlot, M. Krzyzek, Anagnostis Paraskevopoulos, J. Leuthold, Y. Horst, J. Bourderionnet, A. Brignon, E. Lallier, V. Billault, L. Leviandier, J.-M. Conan, N. Védrenne, C. Lim, A. Montmerle-Bonnefois, C. Petit, L. Stampoulidis, M. Fehrenz, T. Lehnigk-Emden
Proceedings Volume 11852, 1185217 (2021) https://doi.org/10.1117/12.2599229

Proceedings Article | 27 May 2009 Paper
A. Paraskevopoulos, S.-H. Voss, M. Talmi, G. Walf
Proceedings Volume 7470, 747011 (2009) https://doi.org/10.1117/12.835200
KEYWORDS: Receivers, Integrated optics, Channel projecting optics, Maskless lithography, Free space optics, Wafer-level optics, Transceivers, Semiconducting wafers, Field programmable gate arrays, Electron beams

Proceedings Article | 18 March 2009 Paper
A. Paraskevopoulos, S.-H. Voss, M. Talmi, G. Walf
Proceedings Volume 7271, 72711I (2009) https://doi.org/10.1117/12.811495
KEYWORDS: Free space optics, Receivers, Channel projecting optics, Maskless lithography, Integrated optics, Data processing, Data transmission, Field programmable gate arrays, Transmitters, Wafer-level optics

Proceedings Article | 28 March 2008 Paper
L. Pain, B. Icard, S. Tedesco, B. Kampherbeek, G. Gross, C. Klein, H. Loeschner, E. Platzgummer, R. Morgan, S. Manakli, J. Kretz, C. Holhe, K.-H. Choi, F. Thrum, E. Kassel, W. Pilz, K. Keil, J. Butschke, M. Irmscher, F. Letzkus, P. Hudek, A. Paraskevopoulos, P. Ramm, J. Weber
Proceedings Volume 6921, 69211S (2008) https://doi.org/10.1117/12.772472
KEYWORDS: Semiconducting wafers, Lithography, Photomasks, Manufacturing, Electron beams, Electron beam lithography, Nanofabrication, Computed tomography, Prototyping, Maskless lithography

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