Ms. Alyssandrea H. Hamad Profile

Alyssandrea H. Hamad

at Cornell Univ

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Author

Publications (3)

Proceedings Article | 12 June 2003 Paper

Evaluation of fluorinated dissolution inhibitors for 157-nm lithography

Alyssandrea Hamad, Francis Houlihan, Larry Seger, Chun Chang, Christopher Ober

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485099

KEYWORDS: Etching, Polymers, Hydrogen, Photoresist materials, Distributed interactive simulations, Polymethylmethacrylate, FT-IR spectroscopy, Neodymium, Lithography, Sodium

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Proceedings Article | 24 July 2002 Paper

Fluorinated dissolution inhibitors for 157-nm lithography

Alyssandrea Hamad, Young Bae, Xiang-Qian Liu, Christopher Ober, Francis Houlihan, Gary Dabbagh, Anthony Novembre

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474245

KEYWORDS: Polymers, FT-IR spectroscopy, Absorbance, Photoresist materials, Lithography, Polymethylmethacrylate, Polymer thin films, Distributed interactive simulations, Absorption, Silicon

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Proceedings Article | 23 June 2000 Paper

Design strategies for 157-nm single-layer photoresists: lithographic evaluation of a poly(A-trifluoromethyl vinyl alcohol) copolymer

Dirk Schmaljohann, Young Bae, Gina Weibel, Alyssandrea Hamad, Christopher Ober

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388297

KEYWORDS: Polymers, Lithography, Photoresist materials, Standards development, Photoresist developing, Absorption, Transparency, Vacuum ultraviolet, Spectroscopy, Resolution enhancement technologies

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