Dr. Alfred J. Reich Profile

Dr. Alfred J. Reich

Manager at NXP Semiconductors

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Author

Publications (12)

Proceedings Article | 14 March 2006 Paper

Using design intent to qualify and control lithography manufacturing

Jim Vasek, Bill Wilkinson, Al Reich, Cesar Garza, Joyce Zhao, Jim Wiley, Moshe Poyastro, Brian Troy, Youval Nehmadi, Zamir Abraham

Proceedings Volume 6156, 61561B (2006) https://doi.org/10.1117/12.656856

KEYWORDS: Lithography, Optical proximity correction, Scanning electron microscopy, Manufacturing, Semiconducting wafers, Electroluminescence, Critical dimension metrology, Control systems, Process control, Resolution enhancement technologies

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Proceedings Article | 6 December 2004 Paper

Predicting computer resource usage

Alfred Reich, Chi-Min Yuan, Robert Boone

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568682

KEYWORDS: Resolution enhancement technologies, Error analysis, Data modeling, Statistical modeling, Statistical analysis, Databases, Semiconductors, Optical proximity correction, Photomasks, Product engineering

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Proceedings Article | 28 May 2004 Paper

Cost of ownership reduction for OPC development and production

Chi-Min Yuan, Bob Jarvis, Kevin Lucas, Robert Boone, Ruiqi Tian, Alfred Reich

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535279

KEYWORDS: Optical proximity correction, Optical lithography, Lithography

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Proceedings Article | 17 December 2003 Paper

Shuttle mask floorplanning

Gang Xu, Ruiqi Tian, Martin Wong, Alfred Reich

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517568

KEYWORDS: Photomasks, Mirrors, Inspection, Algorithms, Semiconducting wafers, Space mirrors, Wafer manufacturing, Manufacturing, Very large scale integration, Computer aided design

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Proceedings Article | 17 December 2003 Paper

OASIS vs. GDSII stream format efficiency

Alfred Reich, Kent Nakagawa, Robert Boone

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518271

KEYWORDS: Digital signal processing, Databases, Product engineering, Computer programming, Semiconductors, Photomasks, Photomask technology, Computer programming languages, Data storage

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Proceedings Article | 10 July 2003 Paper

New stream format: progress report on containing data size explosion

Patrick LaCour, Alfred Reich, Kent Nakagawa, Steffen Schulze, Laurence Grodd

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485260

KEYWORDS: Photomasks, Manufacturing, Inspection, Integrated circuits, Data storage, Binary data, Design for manufacturability, Visualization, Mask making, Integrated circuit design

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Proceedings Article | 2 July 2003 Paper

Practical quality metrics for resolution enhancement software

Robert Boone, Kevin Lucas, Raphael Wynd, Mike Boatright, Matthew Thompson, Alfred Reich

Proceedings Volume 5043, (2003) https://doi.org/10.1117/12.485281

KEYWORDS: Resolution enhancement technologies, Software development, Lithography, Software engineering, Optical proximity correction, Photomasks, Semiconducting wafers, Computer architecture, Phase shifts, Reticles

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The past few years have seen an explosion in the application of software techniques to improve lithographic printing. Techniques such as optical proximity correction (OPC) and phase shift masks (PSM) increase resolution and CD control by distorting the mask pattern data from the original designed pattern. These software techniques are becoming increasingly complicated and non-intuitive; and the rate of complexity increase appears to be accelerating [1]. The benefits of these techniques to improve CD control and lower cost of ownership (COO) is balanced against the effort required to implement them and the additional problems they create. One severe problem for users of immature and complex software tools and methodologies is quality control, [2] as it ultimately becomes a COO problem. Software quality can be defined very simply as the ability of an application to meet detailed customer requirements. Software quality practice can be defined as the adherence to proven methods for planning, developing, testing and maintaining software. Although software quality for lithographic resolution enhancement is extremely important, the understanding and recognition of good software development practices among lithographers is generally poor. We therefore start by reviewing the essential terms and concepts of software quality that impact lithography and COO. We then propose methods by which semiconductor process and design engineers can estimate and compare the quality of the software tools and vendors they are evaluating or using. We include examples from advanced process technology resolution enhancement work that highlight the need for high-quality software practices, and show how to avoid many problems. Note that, although several authors have worked in software application development, our analysis here is somewhat of a black box analysis. The black box is the software development organization of an RET software supplier. Our access to actual developers within these organizations is very limited. In so far as our comments with respect to the internal workings of these development organizations go, we rely on the interactions we have had with applications engineers and other technical specialists who provide our interface to the development organizations.

Proceedings Article | 11 March 2002 Paper

GDSII considered harmful

Alfred Reich, Robert Boone, Warren Grobman, Clyde Browning

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458289

KEYWORDS: Resolution enhancement technologies, Photomasks, Optical proximity correction, Data modeling, Electronic design automation, Data conversion, Semiconducting wafers, Model-based design, Data processing, Binary data

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Proceedings Article | 11 March 2002 Paper

Polarized phase shift mask: concept, design, and potential advantages to photolithography process and physical design

Ruoping Wang, Warren Grobman, Alfred Reich, Matthew Thompson

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458317

KEYWORDS: Photomasks, Phase shifts, Polarization, Printing, Optical lithography, Manufacturing, Neodymium, Opacity, Quartz, Integrated circuits

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Proceedings Article | 20 October 2000 Paper

Overview of reticle enhancement technology software strategy

Alfred Reich, R. Jarvis, Steve Talent, Renee Carter

Proceedings Volume 4226, (2000) https://doi.org/10.1117/12.404842

KEYWORDS: Resolution enhancement technologies, Optical proximity correction, Electronic design automation, Reticles, Photomasks, Computer aided design, Manufacturing, Semiconductors, Semiconducting wafers, Model-based design

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Proceedings Article | 26 July 1999 Paper

Practicing extension of 248-nm DUV optical lithography using trim-mask PSM

Michael Kling, Nigel Cave, Bradley Falch, Chong-Cheng Fu, Kent Green, Kevin Lucas, Bernard Roman, Alfred Reich, John Sturtevant, Ruiqi Tian, Drew Russell, Linard Karklin, Yao-Ting Wang

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354297

KEYWORDS: Photomasks, Binary data, Reticles, Deep ultraviolet, Optical proximity correction, Optical lithography, Optics manufacturing, Manufacturing, Etching, Phase shifts

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Proceedings Article | 29 June 1998 Paper

0.25-um logic manufacturability using practical 2D optical proximity correction

Michael Kling, Kevin Lucas, Alfred Reich, Bernard Roman, Harry Chuang, Percy Gilbert, Warren Grobman, Edward Travis, Paul Tsui, Tam Vuong, Jeff West

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310749

KEYWORDS: Optical proximity correction, Reticles, Metals, Inspection, Logic, Optical lithography, Calibration, Manufacturing, Etching, Lithium

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Showing 5 of 12 publications

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