Dr. Alexandre Lagrange Profile

Dr. Alexandre Lagrange

at CEA-LETI

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 5 March 2021 Presentation + Paper

Ultra-high speed optical wireless communications with gallium-nitride microLED

Luc Maret, Alexandre Lagrange, Ludovic Dupré

Proceedings Volume 11706, 117060O (2021) https://doi.org/10.1117/12.2576092

KEYWORDS: Wafer-level optics, Transmitters, Optical components, Modeling, Modulation, Sapphire, Optical alignment, Wireless communications, Orthogonal frequency division multiplexing, Semiconducting wafers

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Proceedings Article | 8 March 2016 Paper

Monolithic LED arrays, next generation smart lighting sources

Alexandre Lagrange, Hubert Bono, François Templier

Proceedings Volume 9768, 97680X (2016) https://doi.org/10.1117/12.2209574

KEYWORDS: Light sources, Electronics, Light emitting diodes, LED lighting, Silicon, Lamps, Gallium nitride, Head, Light sources and illumination, Light

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Proceedings Article | 25 September 2014 Paper

Complete solid state lighting (SSL) line at CEA LETI

I. Robin, P. Ferret, A. Dussaigne, C. Bougerol, D. Salomon, X. Chen, M. Charles, P. Tchoulfian, A. Gasse, A. Lagrange, M. Consonni, H. Bono, F. Levy, Y. Desieres, A. Aitmani, S. Makram-Matta, E. Bialic, P. Gorrochategui, L. Mendizabal

Proceedings Volume 9190, 91900I (2014) https://doi.org/10.1117/12.2060514

KEYWORDS: Packaging, Quantum wells, Light emitting diodes, LED lighting, Solid state lighting, Silicon, Quantum efficiency, Gallium nitride, Light sources and illumination, Semiconducting wafers

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Proceedings Article | 21 March 2008 Paper

Design requirements for a stand alone EUV interferometer

Ph. Michallon, C. Constancias, A. Lagrange, B. Dalzotto

Proceedings Volume 6921, 69213Y (2008) https://doi.org/10.1117/12.771586

KEYWORDS: Lithography, Optical design, Light sources, Interferometers, Collimation, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Line edge roughness

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Proceedings Article | 7 March 2008 Paper

Contrast management of 193i interferometry to be close to scanners contrast conditions

Alexandre Lagrange, Philippe Bandelier, Christelle Charpin, Olivier Lartigue

Proceedings Volume 6924, 69242G (2008) https://doi.org/10.1117/12.772584

KEYWORDS: Lithography, Modulation, Interferometers, Image processing, Scanners, Interferometry, Photoresist materials, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 21 March 2006 Paper

Assembly of a 193-nm interferometer for immersion lithography: vibration effects on image contrast

Alex Lagrange, Anne Laure Charley, Olivier Lartigue, Marianne Derouard

Proceedings Volume 6154, 61544O (2006) https://doi.org/10.1117/12.652227

KEYWORDS: Lithography, Interferometers, Interferometry, Computer simulations, Photoresist materials, Vibrometry, Immersion lithography, Semiconducting wafers, Statistical modeling, Diffraction gratings

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Proceedings Article | 21 March 2006 Paper

Liquid immersion lithography at 193 nm using a high-NA achromatic interferometer

Anne-Laure Charley, Alexandre Lagrange, Olivier Lartigue, Philippe Bandelier, Marianne Derouard, Patrick Schiavone

Proceedings Volume 6154, 61541Z (2006) https://doi.org/10.1117/12.654404

KEYWORDS: Diffraction, Polarization, Interferometers, Interferometry, Printing, Photoresist materials, Line width roughness, Line edge roughness, Liquids, Diffraction gratings

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Proceedings Article | 7 April 1999 Paper

Automatic YAG damage test benches: additional possibilities

Jean Hue, Jean Dijon, Guillaume Ravel, Philippe Lyan, Pierre Garrec, T. Lanternier, Michel Olivier, Alexandre Lagrange

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344399

KEYWORDS: Laser sources, Mirrors, Laser induced damage, Silicon, Light scattering, Diagnostics, Raster graphics, Laser damage threshold, YAG lasers, Camera shutters

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Showing 5 of 8 publications

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