In the specifications for EUV sources, high EUV power at IF for lithography HVM and very high brightness for actinic
mask and in-situ inspections are required. In practice, the non-equilibrium plasma dynamics and self-absorption of
radiation limit the in-band radiance of the plasma and the usable radiation power of a conventional single unit EUV
source. A new generation of the computational code Z* is currently developed under international collaboration in the
frames of FP7 IAPP project FIRE for modelling of multi-physics phenomena in radiation plasma sources, particularly for
EUVL. The radiation plasma dynamics, the spectral effects of self-absorption in LPP and DPP and resulting Conversion
Efficiencies are considered. The generation of fast electrons, ions and neutrals is discussed. Conditions for the enhanced
radiance of highly ionized plasma in the presence of fast electrons are evaluated. The modelling results are guiding a new
generation of EUV sources being developed at Nano-UV, based on spatial/temporal multiplexing of individual high
brightness units, to deliver the requisite brightness and power for both lithography HVM and actinic metrology
applications.
General concept of development of Russian regional telecommunication networks is considered. Conception is formed under taking into account world tendencies of telecommunications development based on optical networks.
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