Mr. Adam M. Munder Profile

Adam M. Munder

at Univ at Albany

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Publications (1)

Proceedings Article | 30 September 2009 Paper

Correlation of overlay performance and reticle substrate non-flatness effects in EUV lithography

Sudhar Raghunathan, Adam Munder, John Hartley, Jaewoong Sohn, Kevin Orvek

Proceedings Volume 7488, 748816 (2009) https://doi.org/10.1117/12.834746

KEYWORDS: Reticles, Extreme ultraviolet, Extreme ultraviolet lithography, Overlay metrology, Error analysis, Scanners, Semiconducting wafers, Distortion, Photomasks, Wafer-level optics

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