Dr. Abhishek Agrawal
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 April 2024 Presentation + Paper
Pulkit Saksena, Michael Thompson, Sinan Selcuk, Anupam K. C., Jonathan Pegan, Alexander Hryn, Jinnie Aloysius, Sandip Argekar, Mohan Yadav, Abhishek Agrawal, Todd Hoppe, Sarthak Havelia, Chris Mack, Martin McCallum, Charles Wallace
Proceedings Volume 12955, 129550M (2024) https://doi.org/10.1117/12.3010906
KEYWORDS: Line width roughness, Optical lithography, Scanners, Photoresist materials, Light sources and illumination, Extreme ultraviolet lithography

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