High-aspect-ratio micro- and nanostructures play a pivotal role across diverse technological domains, encompassing microelectronics processors, photovoltaic devices, and optoelectronics. The conventional methods of fabricating these structures often involve reactive-ion dry-etch processes utilizing ionized gases or wet chemical-based etching. Recently, the emergence of metal-assisted chemical etching (MacEtch) has showcased significant potential in enabling the creation of nanoscale features with exceptionally high aspect ratios. Nonetheless, the application of MacEtch to quaternary III−V and heteroepitaxial semiconductors remains relatively unexplored. This research introduces a novel approach named inverse-progression metal-assisted chemical etching (I-MacEtch) that centers around the utilization of a bimetallic catalyst, specifically focusing on the utilization of a bimetallic catalyst. This technique is employed to fabricate well-organized arrays of submicron pillars. The study elucidates that precise control over the vertical and lateral etch rate can be attained through the selection of a suitable metal adhesion layer, which improves the overall catalyst work function, thereby facilitating the streamlined fabrication of ordered arrays of InP submicron pillars possessing predefined aspect ratios.
LiYF4 nanocrystals (NCs) doped with 1% and 10% of Yb3+ and capped with oleic-acid were synthesized via a previously reported and modified co-precipitation method. Size, morphology, composition, and colloidal stability of these NCs are reported with data obtained from TEM, XRD, TGA/DSC, XRF, and zeta potential techniques. TEM analysis shows a monodisperse size distribution, with the nanocrystal size of ~20 nm. Optical characterization is described using data collected from UV-Vis-NIR absorption spectrophotometry and photoluminescence spectroscopy. The excellent luminescence in the NIR-II spectral region makes these NCs potential candidate for bioimaging applications.
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