A programmable ultraviolet light-emitting diode (UVLED) array with a transfer lens forms an adjustable intensity distribution upon a mask, whether for the uniform distribution or variable distribution for compensate wavefront error introduced by the lithographic lens, so as to fabricate an aberration-free pattern on a wafer. The collimating and aligning all rays in one aperture lens with a N  ×  N two-dimensional UVLED array is designed and fabricated by integrating with lithographic lens to form aberration-free smallest linewidth in integrated circuit wafer. Our work provides a transfer lens for the UVLED array to manipulate the intensity distribution fitted for the aligner in the soft- and near-contact mode and steppers.