Holographic microlithography

Francis S. M. Clube; Simon Gray; Denis Struchen; Jean-Claude Tisserand; Stephane Malfoy; Yves Darbellay

doi:10.1117/12.205673

1 September 1995 Holographic microlithography

Francis S. M. Clube, Simon Gray, Denis Struchen, Jean-Claude Tisserand, Stephane Malfoy, Yves Darbellay

Author Affiliations +

Optical Engineering, Vol. 34, Issue 9, (September 1995). https://doi.org/10.1117/12.205673

Abstract

Holographic mask aligners represent the latest addition to commercially available lithographic technologies. Their combination of very high resolution (< 0.5 μm) and very large exposure field brings a new capability to the microelectronics industry, especially for the manufacture of flat panel displays. The machine is fully automated and includes a scanning laser illumination system, a dynamic focus system permitting patterns to be printed over poor-flatness substrates, and an alignment system providing 0.3-μm overlay accuracy. A higher-accuracy alignment system under development demonstrates 50-nm measurement accuracy. A step-and-repeat hologram recording method enables tighter control of feature linewidth.

Citation Download Citation

Francis S. M. Clube, Simon Gray, Denis Struchen, Jean-Claude Tisserand, Stephane Malfoy, and Yves Darbellay "Holographic microlithography," Optical Engineering 34(9), (1 September 1995). https://doi.org/10.1117/12.205673

Published: 1 September 1995

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