Fabrication of large-area two-dimensional array of air holes with different hole shapes for optical and terahertz wavelength regions

Raj Patil; Sheng Lan; Achanta V. Gopal

doi:10.1117/1.JNP.8.083896

21 January 2014 Fabrication of large-area two-dimensional array of air holes with different hole shapes for optical and terahertz wavelength regions

Raj Patil, Sheng Lan, Achanta V. Gopal

Author Affiliations +

Journal of Nanophotonics, Vol. 8, Issue 1, 083896 (January 2014). https://doi.org/10.1117/1.JNP.8.083896

Abstract

Fabrication of metal-dielectric nanostructures with subwavelength precision is necessary for plasmon-mediated novel applications. Electron beam lithography (EBL) offers such precision, but for shapes other than circles, squares, and lines, process optimization is required. The EBL and dry etching processes are optimized for subwavelength precision in large area arrays of air groove patterns in gold film in two different length scales. We fabricated one structure for optical frequencies with an asymmetric, nonstandard element having a minimum feature size of about 50 nm and another for terahertz wavelength region with a large aspect ratio of about 975.

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Raj Patil, Sheng Lan, and Achanta V. Gopal "Fabrication of large-area two-dimensional array of air holes with different hole shapes for optical and terahertz wavelength regions," Journal of Nanophotonics 8(1), 083896 (21 January 2014). https://doi.org/10.1117/1.JNP.8.083896

Published: 21 January 2014

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