JM3 Associate Editor Emily Gallagher, a principal researcher at imec, interviews Andreas Erdmann, head of the Fraunhofer IISB Computational Lithography and Optics Group. With Hazem Mesilhy and Peter Evanschitzky, Erdmann is the lead author of “ Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?,” a review paper in the April-June 2022 issue of the Journal of Micro/Nanopatterning, Materials, and Metrology.

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