Abstract

This editorial introduces readers to the newly titled JM3.

© 2021 Society of Photo-Optical Instrumentation Engineers (SPIE)
Harry J. Levinson "The Journey Continues," Journal of Micro/Nanopatterning, Materials, and Metrology 20(1), 010101 (15 January 2021). https://doi.org/10.1117/1.JMM.20.1.010101
Published: 15 January 2021
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KEYWORDS
Optical lithography

Lithography

Semiconductors

Computational lithography

Electronics

Manufacturing

Metrology

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