Open Access
12 February 2020 Guest Editorial: A Transition for JM3
Abstract

This guest editorial by former Editor-in-Chief Chris Mack introduces JM3’s new co-editors-in-chief, Harry Levinson and Hans Zappe.

I began as editor-in-chief of JM3 in January of 2012, and after eight years serving in that role, I have stepped down as of January, 2020. The change brings a wealth of very mixed emotions. My time as editor-in-chief has been tremendously fun, but not without its challenges. I have learned a great amount: about being an editor, about the publishing business, and about how to write a good scientific paper. I will miss the engagement with the JM3 community, especially with the highly professional SPIE staff and the dedicated volunteer senior editors and associate editors who do the bulk of the work to make JM3 successful.

But these feelings of loss are tempered by my excitement about what will come next. Not only is there a new editor-in-chief of JM3, there are two! I’m extremely pleased to pass the baton on to Harry Levinson of HJL Lithography and Hans Zappe of the University of Freiburg. The choice of two co-editors-in-chief reflects the diversity of the JM3 community. Harry comes from a semiconductor lithography and metrology background, while Hans has long worked in the areas of MEMS and MOEMS. Their combined strengths will undoubtedly prove extremely valuable in serving the needs of these different communities. Their charge is not to carry on, but to boldly look at possible new futures for their journal. I, for one, can’t wait to see what they come up with!

© 2020 Society of Photo-Optical Instrumentation Engineers (SPIE)
Chris Mack "Guest Editorial: A Transition for JM3," Journal of Micro/Nanolithography, MEMS, and MOEMS 19(1), 010101 (12 February 2020). https://doi.org/10.1117/1.JMM.19.1.010101
Published: 12 February 2020
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KEYWORDS
Lithography

Heat treatments

Metrology

Microelectromechanical systems

Microopto electromechanical systems

Semiconductors

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