Wavefront aberration of plane diffraction gratings fabricated in a Lloyd’s mirror interferometer

Donghan Ma; Shiwei Wang; Lijiang Zeng

doi:10.1117/1.JMM.16.2.023503

22 May 2017 Wavefront aberration of plane diffraction gratings fabricated in a Lloyd’s mirror interferometer

Donghan Ma, Shiwei Wang, Lijiang Zeng

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 16, Issue 2, 023503 (May 2017). https://doi.org/10.1117/1.JMM.16.2.023503

Abstract

A Lloyd’s mirror interferometer is widely used in holographic lithography to fabricate gratings. Adjustment errors of the interferometer and manufacturing errors of optical elements will both influence the wavefront aberration of a grating. We analyze their influence and propose a method to optimize the wavefront aberration. The correctness of the simulation and the feasibility of the adjustment method are experimentally verified. With this method, low-aberration gratings can be fabricated in a Lloyd’s mirror interferometer.

Citation Download Citation

Donghan Ma, Shiwei Wang, and Lijiang Zeng "Wavefront aberration of plane diffraction gratings fabricated in a Lloyd’s mirror interferometer," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(2), 023503 (22 May 2017). https://doi.org/10.1117/1.JMM.16.2.023503

Received: 24 January 2017; Accepted: 21 April 2017; Published: 22 May 2017

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