Monolithically integrated low-loss three-dimensional spot-size converter and silicon photonic waveguides constructed by nanotuned Bosch process and oxidation

Ling-Han Li; Akio Higo; Masakazu Sugiyama; Yoshiaki Nakano

doi:10.1117/1.3574143

1 April 2011 Monolithically integrated low-loss three-dimensional spot-size converter and silicon photonic waveguides constructed by nanotuned Bosch process and oxidation

Ling-Han Li, Akio Higo, Masakazu Sugiyama, Yoshiaki Nakano

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 10, Issue 2, 023002 (April 2011). https://doi.org/10.1117/1.3574143

Abstract

This paper presents a three-dimensional (3D) tapered spot-size converter connecting to silicon wire waveguide and silicon rib waveguide. The silicon 3D structure was essentially formed by a single-step deep anisotropic dry etching of arrayed submicron-scale line patterns with different pitches, resulting in a tailored depth profile which is controlled by the line pattern through loading effect. Subsequent thermal oxidation and removal of the oxidized portion with wet etching led to a bare 3D silicon structure with smooth surface. The optical mode from a 4.6 μm × 3.1 μm silicon rib waveguide was successfully coupled to a 280 nm × 500 nm nanowire waveguide by a silicon 3D tapered spot-size converter, with average coupling loss of 1.52 dB.

©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Ling-Han Li, Akio Higo, Masakazu Sugiyama, and Yoshiaki Nakano "Monolithically integrated low-loss three-dimensional spot-size converter and silicon photonic waveguides constructed by nanotuned Bosch process and oxidation," Journal of Micro/Nanolithography, MEMS, and MOEMS 10(2), 023002 (1 April 2011). https://doi.org/10.1117/1.3574143

Published: 1 April 2011

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