Extending EUV Lithography

doi:10.1117/3.2581446.ch10

Book: Extreme Ultraviolet Lithography

Author(s): Harry J. Levinson

Published: 2020

https://doi.org/10.1117/3.2581446.ch10

Abstract

Lithographic technology has been extended for several decades through a combination of reduced k₁, increased numerical aperture, shorter wavelengths, and the use of multiple patterning. All of these are possible for EUV lithography and are the topics of this chapter. Because this chapter addresses future technologies that are still undergoing development, much of the text consists of descriptions of known problems that engineers need to solve, rather than explanations of solutions.