The choice of Deposition Equipment for challenging Interference Filter

Harro Hagedorn

doi:10.1117/12.3023781

18 June 2024 The choice of Deposition Equipment for challenging Interference Filter

Harro Hagedorn

Proceedings Volume PC13020, Advances in Optical Thin Films VIII; PC1302004 (2024) https://doi.org/10.1117/12.3023781
Event: SPIE Optical Systems Design, 2024, Strasbourg, France

Abstract

Physical vapor deposition equipment based on evaporation, sputtering or ion beam sputtering will be compared based on results achieved for selected challenging Interference filter. Examples are oxides coatings in the DUV spectral region or step edge filters for the VIS and NIR.

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Harro Hagedorn "The choice of Deposition Equipment for challenging Interference Filter", Proc. SPIE PC13020, Advances in Optical Thin Films VIII, PC1302004 (18 June 2024); https://doi.org/10.1117/12.3023781

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KEYWORDS

Interference filters

Sputter deposition

Ion beams

Magnetrons

Physical vapor deposition

Deep ultraviolet

Tunable filters

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