Direct patterning of high refractive index optical materials for photonic applications

Keiko Munechika; Carlos Pina-Hernandez; Adam Legacy; Kaito Yamada; Scott Dhuey

doi:10.1117/12.3011782

10 April 2024 Direct patterning of high refractive index optical materials for photonic applications

Keiko Munechika, Carlos Pina-Hernandez, Adam Legacy, Kaito Yamada, Scott Dhuey

Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC129560N (2024) https://doi.org/10.1117/12.3011782
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

HighRI Optics reports the development of a polymer with a high refractive index (n = 1.80) and high optical transparency for direct patterning applications. The polymer can be ultraviolet curable and contains no metal oxide fillers. It is one of the polymers with the highest refractive index value available amongst commercial filler-free materials. This new polymer can be patterned via photolithography and electron beam lithography, becoming the first high refractive index polymer with capabilities as a negative tone resist. These properties allow fast and easy prototyping and manufacturing of high refractive index optical devices, including microlens arrays, photonic integrated circuits, etc.

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Citation Download Citation

Keiko Munechika, Carlos Pina-Hernandez, Adam Legacy, Kaito Yamada, and Scott Dhuey "Direct patterning of high refractive index optical materials for photonic applications", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC129560N (10 April 2024); https://doi.org/10.1117/12.3011782

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KEYWORDS

Refractive index

Polymers

Electron beam lithography

Optical properties

Optical lithography

Polymer optics

Optical components

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