Coater/developer based techniques to achieve sub-30nm CAR process on EUV stack

Kanzo Kato; Lior Huli; Dave Hetzer; Satoru Shimura; Shinichiro Kawakami; Soichiro Okada; Takahiro Kitano; Akihiro Sonoda; Karen Petrillo; Luciana Meli; Cody Murray; Alex Hubbard

doi:10.1117/12.2613805

13 June 2022 Coater/developer based techniques to achieve sub-30nm CAR process on EUV stack

Kanzo Kato, Lior Huli, Dave Hetzer, Satoru Shimura, Shinichiro Kawakami, Soichiro Okada, Takahiro Kitano, Akihiro Sonoda, Karen Petrillo, Luciana Meli, Cody Murray, Alex Hubbard

Author Affiliations +

Proceedings Volume PC12055, Advances in Patterning Materials and Processes XXXIX; PC120550L (2022) https://doi.org/10.1117/12.2613805
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Conference Poster

There is no online version at this time. The PDF is only available to people who have bought the paper or have a subscription.

Citation Download Citation

Kanzo Kato, Lior Huli, Dave Hetzer, Satoru Shimura, Shinichiro Kawakami, Soichiro Okada, Takahiro Kitano, Akihiro Sonoda, Karen Petrillo, Luciana Meli, Cody Murray, and Alex Hubbard "Coater/developer based techniques to achieve sub-30nm CAR process on EUV stack", Proc. SPIE PC12055, Advances in Patterning Materials and Processes XXXIX, PC120550L (13 June 2022); https://doi.org/10.1117/12.2613805

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available