Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists

Meiliana Siauw; Ke Du; David Valade; Peter Trefonas; James W. Thackeray; Andrew Whittaker; Idriss Blakey

doi:10.1117/12.2219638

21 March 2016 Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists

Meiliana Siauw, Ke Du, David Valade, Peter Trefonas, James W. Thackeray, Andrew Whittaker, Idriss Blakey

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Proceedings Volume 9779, Advances in Patterning Materials and Processes XXXIII; 97790J (2016) https://doi.org/10.1117/12.2219638
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Metal oxide nanoparticle resists have recently emerged as next generation photoresist materials which exhibit promising performance for extreme ultraviolet lithography. In this present work, we are able to show our ability to synthesize and well characterize small uniform metal oxide nanoparticles, to present stability study of the nanoparticles in the resist solvent over time, to pattern ~20 nm features by electron beam lithography, and to provide an insight into the insolubilization mechanism of the resist system.

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Meiliana Siauw, Ke Du, David Valade, Peter Trefonas, James W. Thackeray, Andrew Whittaker, and Idriss Blakey "Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 97790J (21 March 2016); https://doi.org/10.1117/12.2219638

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KEYWORDS

Nanoparticles

Oxides

Metals

Electron beam lithography

Scanning electron microscopy

Particles

Photoresist materials

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