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18 March 2016 Novel detection and process improvement for organic coating-film defects
Masahiko Harumoto, Yuji Tanaka, Akihiro Hisai, Masaya Asai, Hideo Ota, Fumiaki Endo, Kazuo Takahashi
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Proceedings Volume 9776, Extreme Ultraviolet (EUV) Lithography VII; 97761X (2016) https://doi.org/10.1117/12.2218981
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States
Abstract
Spin coating has been used as a photoresist application method for many years,[1,2] and it has continued to include applications such as the tri-layer with stacked photoresist, Si containing anti-reflected coating (Si-ARC), and Spin on Carbon (SOC). Last year we reported EUV defectivity improvement, but the causes of some defect types were not found.[3,4] In this study, the defects unique to the coated organic film were detected using an LS9300 by Hitachi High-Technologies, and some of these defects were able to be mitigated by optimizing the SOKUDO-DUO track system. Utilizing these systems in tandem, we have revealed a mechanism of EUV pattern defect reduction linked to novel detected film coating defects. During the conference, we will discuss expansion of this concept to other film coatings.
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Masahiko Harumoto, Yuji Tanaka, Akihiro Hisai, Masaya Asai, Hideo Ota, Fumiaki Endo, and Kazuo Takahashi "Novel detection and process improvement for organic coating-film defects", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761X (18 March 2016); https://doi.org/10.1117/12.2218981
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KEYWORDS
Extreme ultraviolet
Coating
Defect detection
Scanning electron microscopy
Particles
Photoresist materials
Process control
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