Actinic mask imaging: recent results and future directions from the SHARP EUV microscope

Kenneth A. Goldberg; Markus P. Benk; Antoine Wojdyla; Iacopo Mochi; Senajith B. Rekawa; Arnaud P. Allezy; Michael R. Dickinson; Carl W. Cork; Weilun Chao; Daniel J. Zehm; James B. Macdougall; Patrick P. Naulleau; Anne Rudack

doi:10.1117/12.2048364

17 April 2014 Actinic mask imaging: recent results and future directions from the SHARP EUV microscope

Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, Iacopo Mochi, Senajith B. Rekawa, Arnaud P. Allezy, Michael R. Dickinson, Carl W. Cork, Weilun Chao, Daniel J. Zehm, James B. Macdougall, Patrick P. Naulleau, Anne Rudack

Author Affiliations +

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 90480Y (2014) https://doi.org/10.1117/12.2048364
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

The SEMATECH High Numerical Aperture Actinic Reticle Review Project (SHARP) is a synchrotron-based extreme ultraviolet (EUV) microscope dedicated to photomask research. SHARP has been operational and serving users since June, 2013, and in eight months, SHARP has recorded over 71,000 high-resolution images. Exposure times are 5 to 8 seconds, and 8 or more through-focus series can be collected per hour at positions spanning the entire mask surface. SHARP’s lossless coherence-control illuminator and variable numerical aperture (NA) enable researchers to emulate the imaging properties of both current and future EUV lithography tools. SHARP’s performance continues to improve over time due to tool learning and upgraded capabilities, described here. Within a centered, 3-μm square image region, we demonstrate an illumination power stability above 99%, and an average uniformity of 98.4%. Demonstrations of through-focus imaging with various illumination coherence settings highlight the capabilities of SHARP.

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Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, Iacopo Mochi, Senajith B. Rekawa, Arnaud P. Allezy, Michael R. Dickinson, Carl W. Cork, Weilun Chao, Daniel J. Zehm, James B. Macdougall, Patrick P. Naulleau, and Anne Rudack "Actinic mask imaging: recent results and future directions from the SHARP EUV microscope", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90480Y (17 April 2014); https://doi.org/10.1117/12.2048364

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